The behavior of chemical and magnetic interfaces is explored using diffuse x-ray resonant magnetic scattering (XRMS) for CoFe thin films with varying interfacial roughnesses. A comparison of the chemical versus magnetic interfaces shows distinct differences in the behavior of these two related interfaces as the chemical roughness is increased. Such changes appear to be correlated with the behavior of the magnetic hysteresis of the interface, measured by tracking the diffuse XRMS intensity as a function of applied magnetic field.

1.
J. F.
MacKay
,
C.
Teichert
,
D. E.
Savage
, and
M. G.
Lagally
,
Phys. Rev. Lett.
77
,
3925
(
1996
).
2.
Y. U. Idzerda, V. Chakarian, and J. W. Freeland, Synch. Radiat. News 10, 6 (1997).
3.
S.
Zhang
and
P. M.
Levy
,
Phys. Rev. B
43
,
11
048
(
1991
).
4.
M.
Suzuki
and
Y.
Taga
,
Phys. Rev. B
52
,
361
(
1995
).
5.
Z. J.
Zang
and
M. R.
Scheinfein
,
Phys. Rev. B
52
,
4263
(
1995
).
6.
S. K.
Sinha
,
E. B.
Sirota
,
S.
Garoff
, and
H. B.
Stanley
,
Phys. Rev. B
38
,
2297
(
1988
).
7.
H.-N. Yang, G.-C. Wang, and T.-M. Lu, Diffraction From Rough Surfaces and Dynamic Growth Fronts (World Scientific, River Edge, NJ, 1993).
8.
K.
Namikawa
,
M.
Ando
,
T.
Nakajima
, and
H.
Kawata
,
J. Appl. Phys.
54
,
4099
(
1985
).
9.
C.
Kao
,
J. B.
Hastings
,
E. D.
Johnson
,
D. P.
Siddons
, and
G. C.
Smith
,
Phys. Rev. Lett.
65
,
373
(
1990
).
10.
C.-C.
Kao
,
C. T.
Chen
,
E. D.
Johnson
,
D. P.
Siddons
,
H. J.
Lin
,
G. H.
Ho
,
G.
Meigs
,
J.-M.
Brot
,
S. L.
Hulbert
,
Y. U.
Idzerda
, and
C.
Vettier
,
Phys. Rev. B
50
,
9599
(
1994
).
11.
J. M.
Tonnerre
,
L.
Seve
,
D.
Raoux
,
G.
Soullie
,
B.
Rodmacq
, and
P.
Wolfers
,
Phys. Rev. Lett.
75
,
740
(
1995
).
12.
V.
Chakarian
,
Y. U.
Idzerda
,
C.-C.
Kao
, and
C. T.
Chen
,
J. Magn. Magn. Mater.
165
,
52
(
1997
).
13.
J. W.
Freeland
,
V.
Chakarian
,
Y. U.
Idzerda
,
S.
Doherty
,
J. G.
Zhu
,
J.-H.
Park
, and
C.-C.
Kao
,
Appl. Phys. Lett.
71
,
276
(
1997
).
14.
V. Chakarian, Y. U. Idzerda, G. Meigs, C. T. Chen, and C. -C. Kao, in Synchrotron Radiation Techniques in Industrial, Chemical, and Materials Science, edited by L. J. Terminello, K. L. D’Amico, and D. K. Shuh (Plenum, New York, 1996), pp. 187–205.
15.
S.
Hulbert
,
D. J.
Holly
,
F. H.
Middleton
, and
D. J.
Wallace
,
Nucl. Instrum. Methods Phys. Res. A
291
,
343
(
1990
).
16.
E. D.
Johnson
,
C. -C.
Kao
, and
J. B.
Hastings
,
Rev. Sci. Instrum.
63
,
1443
(
1992
).
17.
C. T.
Chen
,
F.
Sette
,
Y.
Ma
, and
S.
Modesti
,
Phys. Rev. B
42
,
7262
(
1990
).
18.
Y. U.
Idzerda
,
C. T.
Chen
,
H. -J.
Lin
,
G.
Meigs
,
G. H.
Ho
, and
C. -C.
Kao
,
Nucl. Instrum. Methods Phys. Res. A
347
,
134
(
1994
).
19.
V. Chakarian, Y. U. Idzerda, and C. T. Chen, Phys. Rev. B (to be published).
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