thin films, with various ratios, suitable for solar cells were processed by selenizing stacked Cu, Ga, and In precursor layers in a reactor in the temperature range of 400–500 °C. Cu/Ga/In and Cu/In/Ga precursors were obtained by sequential sputtering of the elemental layers. The Cu/Ga/In and Cu/In/Ga precursors, and the selenized films were characterized by scanning electron microscopy, x-ray diffraction, energy dispersive spectroscopy, and Auger electron spectroscopy. The precursors contained only binary and elemental phases in the as-deposited condition and after annealing. The selenized films had a nonuniform distribution of Ga and In. The surface of the selenized films were In rich, while the Mo/film interface in these films was Ga rich. The selenized films with ratios greater than 0.25 contain graded Ga and In compositions, and the selenized films with ratios less than 0.6 contain a phase-separated mixture of and with the near the surface and the near the Mo/film interface. Single phase, homogeneous films were obtained by annealing the as-selenized films in argon in the temperature range of 500–600 °C for 60 min. Interdiffusion of In and Ga between the and the phases was found to be responsible for the homogenization process. This homogenization process does not occur in the presence of a selenium atmosphere. Diffusion measurements yielded similar interdiffusion coefficients for Ga and In. The annealing temperature and time to effect homogenization depends on the ratio of the absorber films. Films with lower ratios require a homogenization temperature of 600 °C or more and films with higher ratios homogenize at a lower temperature of 400–500 °C, for an annealing time of 60 min.
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15 September 1997
Research Article|
September 15 1997
Phases, morphology, and diffusion in thin films Available to Purchase
M. Marudachalam;
M. Marudachalam
Institute of Energy Conversion, United States Department of Energy Center of Excellence for Photovoltaic Research and Education, University of Delaware, Newark, Delaware 19716
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R. W. Birkmire;
R. W. Birkmire
Institute of Energy Conversion, United States Department of Energy Center of Excellence for Photovoltaic Research and Education, University of Delaware, Newark, Delaware 19716
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H. Hichri;
H. Hichri
Institute of Energy Conversion, United States Department of Energy Center of Excellence for Photovoltaic Research and Education, University of Delaware, Newark, Delaware 19716
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J. M. Schultz;
J. M. Schultz
Department of Chemical Engineering, University of Delaware, Newark, Delaware 19716
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A. Swartzlander;
A. Swartzlander
National Renewable Energy Laboratory, Golden, Colorado 80401
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M. M. Al-Jassim
M. M. Al-Jassim
National Renewable Energy Laboratory, Golden, Colorado 80401
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M. Marudachalam
Institute of Energy Conversion, United States Department of Energy Center of Excellence for Photovoltaic Research and Education, University of Delaware, Newark, Delaware 19716
R. W. Birkmire
Institute of Energy Conversion, United States Department of Energy Center of Excellence for Photovoltaic Research and Education, University of Delaware, Newark, Delaware 19716
H. Hichri
Institute of Energy Conversion, United States Department of Energy Center of Excellence for Photovoltaic Research and Education, University of Delaware, Newark, Delaware 19716
J. M. Schultz
Department of Chemical Engineering, University of Delaware, Newark, Delaware 19716
A. Swartzlander
National Renewable Energy Laboratory, Golden, Colorado 80401
M. M. Al-Jassim
National Renewable Energy Laboratory, Golden, Colorado 80401
J. Appl. Phys. 82, 2896–2905 (1997)
Article history
Received:
March 04 1997
Accepted:
May 28 1997
Citation
M. Marudachalam, R. W. Birkmire, H. Hichri, J. M. Schultz, A. Swartzlander, M. M. Al-Jassim; Phases, morphology, and diffusion in thin films. J. Appl. Phys. 15 September 1997; 82 (6): 2896–2905. https://doi.org/10.1063/1.366122
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