Nanosecond KrF excimer laser ablation of benzyl chloride, benzyl alcohol, toluene, ethylbenzene, and -propylbenzene diluted in -hexane, -heptane, dichloromethane, and 1,2-dichloroethane was investigated by time-resolved photographic, photoacoustic, and absorbance measurements. Ablation threshold values, for high concentration solutions ( 0.6–1 M) were confirmed to be correlated to photochemical reactivity (β-bond cleavage) of the solute molecules, whereas no distinct relation between and boiling point of solvents was observed. Time-resolved absorbance at the laser wavelength was almost constant during the excitation pulse, which means that the main light-absorbing molecules were fixed to the ground-state solutes. It is considered that this type of ablation is initiated by the photochemical fragmentation. On the contrary, observed in relatively low concentration solutions ( 0.06–0.1 M) were about twice higher than those for the high concentration solutions, and had no direct correlation with the photochemical reactivity of the solute molecules. The time-resolved absorbance increased during the excitation pulse, and was ascribed to the fact that benzyl radicals produced by the photodissociation of solute molecules absorbed the excitation photons and converted them into heat through “a cyclic multiphotonic absorption process.” Furthermore, morphological aspects observed in nanosecond photography exhibited appreciable differences by varying the solute concentrations. These results clearly mean a concentration-dependent ablation mechanism; the ablation mechanism of the benzene derivative solutions switches from photochemical to photothermal as the solute concentration decreases.
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1 December 1997
Research Article|
December 01 1997
Switching from photochemical to photothermal mechanism in laser ablation of benzene solutions
Koji Hatanaka;
Koji Hatanaka
Department of Applied Physics, Osaka University, Suita, Osaka 565, Japan
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Mitsushi Kawao;
Mitsushi Kawao
Department of Applied Physics, Osaka University, Suita, Osaka 565, Japan
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Yasuyuki Tsuboi;
Yasuyuki Tsuboi
Department of Applied Physics, Osaka University, Suita, Osaka 565, Japan
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Hiroshi Fukumura;
Hiroshi Fukumura
Department of Applied Physics, Osaka University, Suita, Osaka 565, Japan
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Hiroshi Masuhara
Hiroshi Masuhara
Department of Applied Physics, Osaka University, Suita, Osaka 565, Japan
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J. Appl. Phys. 82, 5799–5806 (1997)
Article history
Received:
February 20 1997
Accepted:
August 04 1997
Citation
Koji Hatanaka, Mitsushi Kawao, Yasuyuki Tsuboi, Hiroshi Fukumura, Hiroshi Masuhara; Switching from photochemical to photothermal mechanism in laser ablation of benzene solutions. J. Appl. Phys. 1 December 1997; 82 (11): 5799–5806. https://doi.org/10.1063/1.366447
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