The microwave surface reactance of copper was measured over the temperature range from 300 to 14 K using the mode of a cylindrical cavity. The result was that with decreasing temperature the ratio of the reactive-to-resistive component remained at around 1 from 300 to 75 K, and increased to 1.32 at 14 K, in contrast to the theoretical extreme anomalous limit, equal to or higher than The discrepancy between the measured and theoretical values may be attributed to the quality of the material and the surface finishing. In this experiment an accurate measurement of the resonant frequency is important. Associated with the frequency, we discuss two thermal-expansion measurement techniques: cavity dilatometry and capacitance dilatometry. Further, the usefulness of the present data for studying high- films will be mentioned.
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1 December 1997
Research Article|
December 01 1997
Thermal expansion and microwave surface reactance of copper from the normal to anomalous skin effect region Available to Purchase
Shigemi Inagaki;
Shigemi Inagaki
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
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Eizi Ezura;
Eizi Ezura
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
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Jian-Fei Liu;
Jian-Fei Liu
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
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Hiroshi Nakanishi
Hiroshi Nakanishi
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
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Shigemi Inagaki
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
Eizi Ezura
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
Jian-Fei Liu
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
Hiroshi Nakanishi
KEK, National Laboratory for High Energy Physics, 1-1, Oho, Tsukuba, Ibaraki 305 Japan
J. Appl. Phys. 82, 5401–5410 (1997)
Article history
Received:
March 20 1997
Accepted:
September 03 1997
Citation
Shigemi Inagaki, Eizi Ezura, Jian-Fei Liu, Hiroshi Nakanishi; Thermal expansion and microwave surface reactance of copper from the normal to anomalous skin effect region. J. Appl. Phys. 1 December 1997; 82 (11): 5401–5410. https://doi.org/10.1063/1.365567
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