We report on the metal-insulator transition of thin films deposited by pulsed laser ablation on substrates. The films were cooled in oxygen partial pressures between 760 and Torr and electrical resistivity of the films was measured as a function of cooling oxygen pressure. films changed from metallic to insulating behavior depending on their oxygen content. A defect model has been proposed to explain this transition and the change in conductivity is related to the change in the oxidation state of the cobalt ions. The model explains the relationship between oxygen partial pressure and electrical conductivity in , which describes the experimental dependence reasonably well. Positron annihilation studies were also done on the same set of samples and the S parameter was seen to increase by 8% from a fully oxygenated sample to a sample cooled in Torr.
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15 April 1997
Research Article|
April 15 1997
Effect of oxygen stoichiometry on the electrical properties of electrodes
Sucharita Madhukar;
Sucharita Madhukar
Department of Materials and Nuclear Engineering, University of Maryland, College Park, Maryland 20742
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S. Aggarwal;
S. Aggarwal
Department of Materials and Nuclear Engineering, University of Maryland, College Park, Maryland 20742
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A. M. Dhote;
A. M. Dhote
Department of Materials and Nuclear Engineering, University of Maryland, College Park, Maryland 20742
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R. Ramesh;
R. Ramesh
Department of Materials and Nuclear Engineering, University of Maryland, College Park, Maryland 20742
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A. Krishnan;
A. Krishnan
Department of Physics, Michigan Technological University, Houghton, Michigan 49931
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D. Keeble;
D. Keeble
Carnegie Laboratory of Physics, University of Dundee, Dundee DD14HN, United Kingdom
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E. Poindexter
E. Poindexter
Army Research Laboratory, Fort Monmouth, New Jersey 07703
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J. Appl. Phys. 81, 3543–3547 (1997)
Article history
Received:
November 11 1996
Accepted:
January 07 1997
Citation
Sucharita Madhukar, S. Aggarwal, A. M. Dhote, R. Ramesh, A. Krishnan, D. Keeble, E. Poindexter; Effect of oxygen stoichiometry on the electrical properties of electrodes. J. Appl. Phys. 15 April 1997; 81 (8): 3543–3547. https://doi.org/10.1063/1.364991
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