Microfabrication techniques are successfully used for semiconducting materials, while they are limited for the application to magnetic materials. For the magnetic materials, useful RIE (reactive‐ion‐etching) process that is essential for high‐resolution microlithography has not yet been successful. In this work, RIE method useful for permalloy (80%Ni‐4.5%Mo‐Fe) has been newly constructed. High‐resolution electron‐beam writing was followed by the RIE process, leading to 250 nm line and space patterns in the permalloy film with 10 nm accuracy. In order to achieve a high‐resolution electron‐beam writing, amorphous carbon film was use between the resist layer and SiO2 film overlaid on the permalloy film. There are four levels in the process. Most critical step in the fabrication of magnetic material is RIE process using a rf discharged plasma of NH3‐CO mixed gas. Maximum etching rate of 35 nm/min and highly anisotropic etching for the permalloy was obtained at the composition of 50 mol % NH3‐CO at the pressure of 2.4×10−3 Torr. The etching selectivity ratio of permalloy to SiO2 employed as a mask was about 10. By this method, nanostructures of permalloy with highly anisotropic profile were fabricated. This method shows prominent features still for Co‐Cr alloy films.
Skip Nav Destination
Article navigation
15 April 1996
The 40th annual conference on magnetism and magnetic materials
6−9 Nov 1995
Philadelphia, Pennsylvania (USA)
Abstract|
April 15 1996
Ultramicro fabrications on Fe‐Ni alloy films using electron‐beam writing and reactive‐ion etching (abstract)
I. Nakatani
I. Nakatani
National Research Institute for Metals, Tsukuba 305, Japan
Search for other works by this author on:
J. Appl. Phys. 79, 5067 (1996)
Citation
I. Nakatani; Ultramicro fabrications on Fe‐Ni alloy films using electron‐beam writing and reactive‐ion etching (abstract). J. Appl. Phys. 15 April 1996; 79 (8): 5067. https://doi.org/10.1063/1.361575
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
7
Views
Citing articles via
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.
Related Content
Nonmonotonic length dependence of switching field of nanolithographically defined single‐domain nickel and cobalt bars (abstract)
J. Appl. Phys. (April 1996)
A simple pneumatic pulling mechanism for the production of micropipettes
Rev. Sci. Instrum. (August 1992)
Application of infrared spectroscopy in vacuum
J. Vac. Sci. Technol. A (March 1990)
Role of the Basilar Membrane Capillary in Control of Organ of Corti Physiology
J. Acoust. Soc. Am. (January 1972)
Dynamic measurement of ultramicro amounts of gases with an ionization gauge
Rev. Sci. Instrum. (November 1984)