The anisotropy of the thermal oxidation of 6H‐SiC has been investigated. Spheres of Acheson and modified Lely single crystals were prepared and subsequently oxidized under wet oxidation conditions. Afterwards the spheres showed an impressive image of interference colors in different crystal orientations due to different oxide thicknesses. The star‐shaped structure on the (0001) Si face and the regular structure in the plane perpendicular to the c axis with six maxima and six minima is remarkable. The orientation of one maximum of oxide thickness could be assigned from Laue diffraction patterns to the (11̄00) and the orientation of one minimum of oxide thickness to the (112̄0) orientation. The oxide thicknesses were determined by Rutherford backscattering spectrometry and subsequently fitting of the measured Rutherford backscattering spectra by a spectrometry simulation program on various points on the spheres. The oxide thickness was determined as a function of the azimuth angle of the sphere. Different behavior at the interface SiC/SiO2 for the (0001) Si face and the (0001̄) C face was observed and is discussed.
Skip Nav Destination
Article navigation
15 March 1996
Research Article|
March 15 1996
Anisotropic oxidation of 6H‐SiC
K. Christiansen;
K. Christiansen
Institut für Angewandte Physik, Universität Erlangen‐Nürnberg, Staudtstrasse 7, D‐91058 Erlangen, Germany
Search for other works by this author on:
R. Helbig
R. Helbig
Institut für Angewandte Physik, Universität Erlangen‐Nürnberg, Staudtstrasse 7, D‐91058 Erlangen, Germany
Search for other works by this author on:
J. Appl. Phys. 79, 3276–3281 (1996)
Article history
Received:
August 08 1995
Accepted:
November 20 1995
Citation
K. Christiansen, R. Helbig; Anisotropic oxidation of 6H‐SiC. J. Appl. Phys. 15 March 1996; 79 (6): 3276–3281. https://doi.org/10.1063/1.361225
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Scaling effects on the microstructure and thermomechanical response of through silicon vias (TSVs)
Shuhang Lyu, Thomas Beechem, et al.
Related Content
Growth of high quality 6H‐SiC epitaxial films on vicinal (0001) 6H‐SiC wafers
Appl. Phys. Lett. (April 1990)
Thermal Conductivity of Acheson Graphite
Physics (September 1933)
Growth of improved quality 3C‐SiC films on 6H‐SiC substrates
Appl. Phys. Lett. (April 1990)
Impurity incorporation kinetics during modified-Lely growth of SiC
J. Appl. Phys. (April 1998)
The Specific Heat of Graphite from 13° to 300°K
J. Chem. Phys. (October 1953)