Successful growth of ErSb(001) single crystal layers on GaSb(001) substrates has been demonstrated. The reflection high‐energy electron diffraction patterns show a (4×4) surface reconstruction. Reflection high‐energy electron diffraction oscillations, x‐ray diffraction, and Rutherford backscattering with channeling indicate single crystal monolayer‐by‐monolayer growth and continuity of the Sb sublattice at the ErSb/GaSb interface. The ErSb has a low room temperature resistivity equal to 30 μΩ cm but may be used as a metallic reflector only for wavelengths greater than 2.4 μm. The overgrowth of GaSb on ErSb leads to mirrorlike surfaces but the overlayers contain symmetry‐related defects. On the contrary, nearly perfect GaSb overlayers were grown on [ErSb,GaSb] superlattices which exhibit metallic behavior.
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15 March 1994
Research Article|
March 15 1994
ErSb/GaSb(001) and GaSb/ErSb/GaSb(001) heterostructures and [ErSb,GaSb] superlattices: Molecular beam epitaxy growth and characterization Available to Purchase
A. Guivarc’h;
A. Guivarc’h
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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Y. Ballini;
Y. Ballini
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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Y. Toudic;
Y. Toudic
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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M. Minier;
M. Minier
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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P. Auvray;
P. Auvray
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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B. Guenais;
B. Guenais
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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J. Caulet;
J. Caulet
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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B. Le Merdy;
B. Le Merdy
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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B. Lambert;
B. Lambert
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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A. Regreny
A. Regreny
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
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A. Guivarc’h
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
Y. Ballini
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
Y. Toudic
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
M. Minier
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
P. Auvray
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
B. Guenais
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
J. Caulet
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
B. Le Merdy
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
B. Lambert
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
A. Regreny
FRANCE TELECOM, Centre National d’Etudes des Télécommunications, Lannion B (LAB/OCM/MPA), BP 40, 22301 Lannion, France
J. Appl. Phys. 75, 2876–2883 (1994)
Article history
Received:
August 06 1993
Accepted:
November 23 1993
Citation
A. Guivarc’h, Y. Ballini, Y. Toudic, M. Minier, P. Auvray, B. Guenais, J. Caulet, B. Le Merdy, B. Lambert, A. Regreny; ErSb/GaSb(001) and GaSb/ErSb/GaSb(001) heterostructures and [ErSb,GaSb] superlattices: Molecular beam epitaxy growth and characterization. J. Appl. Phys. 15 March 1994; 75 (6): 2876–2883. https://doi.org/10.1063/1.356181
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