Multiple steady states have been observed in a 13.56 MHz chlorine glow discharge in a parallel plate radial flow reactor. Measurements of the flux and energy distribution of positive ions bombarding the electrode are reported along with radial profiles of atomic chlorine (Cl) concentration and etch rate of polysilicon for different states of the plasma. At the same operating conditions the plasma may exist in one of two states. In one state the plasma appeared radially uniform, resulting in relatively uniform radial Cl concentration profiles and etch rate. In the other state the plasma appeared radially nonuniform with a higher intensity central region (‘‘plasmoid’’). The etch rate and Cl concentration profiles were nonuniform in the presence of the plasmoid. The plasmoid generally appeared under conditions of high power and pressure and could be eliminated by adding noble gases and/or decreasing the electrode spacing. The multiple states may be a result of the strongly electronegative nature of the chlorine discharge.

1.
D. M. Manos and D. L. Flamm, eds., Plasma Etching: An Introduction (Academic, New York, 1989).
2.
N. G. Einspruch and D. M. Brown, eds., VLSI Electronics: Microstructure Science, Vol. 8, Plasma Processing for VLSI (Academic, New York, 1984).
3.
G. L.
Rogoff
,
J. M.
Kramer
, and
R. B.
Piejak
,
IEEE Trans. Plasma Sci.
,
PS-14
,
103
(
1986
).
4.
H. H.
Sawin
,
A. D.
Richards
, and
B. E.
Thompson
,
ACS Symp. Series
,
290
,
164
(
1985
).
5.
A. D.
Richards
,
B. E.
Thompson
,
K. D.
Allen
, and
H. H.
Sawin
,
J. Appl. Phys.
62
,
792
(
1987
).
6.
V. M.
Donnelly
,
D. L.
Flamm
, and
R.
Bruce
,
J. Appl. Phys.
58
,
2135
(
1985
).
7.
G. S.
Selwyn
,
L. D.
Baston
, and
H. H.
Sawin
,
Appl. Phys. Lett.
51
,
898
(
1987
).
8.
R. A.
Gottscho
and
C. E.
Gaebe
,
IEEE Trans. Plasma Sci.
PS-14
,
92
(
1986
).
9.
J. W. Dettmer, Ph.D. thesis, Air Force Institute of Technology (1978).
10.
L. T.
Lamont
, Jr.
and
J. J.
DeLeone
, Jr.
,
J. Vac. Sci. Technol.
7
,
155
(
1969
).
11.
D. L.
Flamm
,
P. L.
Cowan
, and
J. A.
Golovchenko
,
J. Vac. Sci. Technol.
17
,
1341
(
1980
).
12.
B. E.
Thompson
,
K. D.
Allen
,
A. D.
Richards
, and
H. H.
Sawin
,
J. Appl. Phys.
59
,
1890
(
1986
).
13.
D. J.
Economou
,
S.-K.
Park
, and
G. D.
Williams
,
J. Electrochem. Soc.
136
,
188
(
1989
).
14.
R. A.
Gottscho
and
V. M.
Donnelly
,
J. Appl. Phys.
56
,
245
(
1984
).
15.
H. H.
Busta
,
R. E.
Lajos
, and
D. A.
Kiewit
,
Solid State Technol.
22
,
61
(
1979
).
16.
M.
Sternheim
,
W.
van Gelder
, and
A. W.
Hartman
,
J. Electrochem. Soc.
130
,
655
(
1983
).
17.
R. A.
Haas
,
Phys. Rev. A
8
,
1017
(
1973
).
18.
E. F.
Jaeger
,
L.
Oster
, and
A. V.
Phelps
,
Phys. Fluids
19
,
819
(
1976
).
19.
D. B.
Ogle
and
G. A.
Woosley
,
J. Phys. D Appl. Phys.
20
,
453
(
1987
).
20.
J.
Taillet
,
Am. J. Phys.
37
,
423
(
1969
).
21.
P. E.
Vandenplas
and
R. W.
Gould
,
Physica
,
28
,
357
(
1962
).
22.
E.
Gogolides
,
J-P.
Nicolai
, and
H. H.
Sawin
,
J. Vac. Sci. Technol. A
7
,
1001
(
1989
).
23.
H.
Shan
,
S. A.
Self
, and
J. P.
McVittie
,
177th Electrochem. Soc. Meeting Extended Abstracts
90-1
, No.
103
,
145
(
1990
).
24.
P. G.
Daniels
,
R. N.
Franklin
, and
J.
Snell
,
J. Phys. D Appl. Phys.
23
,
823
(
1990
).
This content is only available via PDF.
You do not currently have access to this content.