The longitudinal distribution of midgap native donor concentration was investigated in detail using semi‐insulating liquid‐encapsulated Czochralski GaAs crystals grown from various melt compositions. The midgap native donor concentration was found to decrease with fractional solidification under Ga‐rich conditions, to increase under As‐rich conditions, and not to change under stoichiometric conditions. Moreover, it varied with the magnetic field intensity and the crystal‐pulling speed depending on the melt composition. These phenomena were consistently explained by assuming that the midgap native donor acts like a dopant with a certain segregation coefficient k, where k<1 under As‐rich conditions, k=1 under stoichiometric conditions, and k>1 under Ga‐rich conditions. This is in good agreement with the expected segregation of As atoms determined from a phase diagram with a narrow solid‐solution region.

1.
T.
Obokata
,
T.
Matsumura
,
K.
Terashima
,
F.
Onto
,
T.
Kikuta
, and
T.
Fukuda
,
Jpn. J. Appl. Phys.
23
,
L602
(
1984
).
2.
T.
Matsumura
,
T.
Obokata
, and
T.
Fukuda
,
J. Appl. Phys.
57
,
1182
(
1985
).
3.
H.
Miyairi
,
T.
Inada
,
T.
Obokata
,
T.
Katsumata
, and
T.
Fukuda
,
Jpn. J. Appl. Phys.
24
,
L729
(
1985
).
4.
S. Makram‐Ebeid, P. Langlade, and G. M. Martin, in Semi‐insulating III‐V Materials, edited by D. C. Look and J. S. Blakemore (Shiva, England, 1984), p. 184.
5.
G. M.
Martin
,
A.
Mitonneau
, and
A.
Mircea
,
Electron. Lett.
13
,
191
(
1977
).
6.
T.
Figielski
,
Appl. Phys. A
35
,
255
(
1984
).
7.
G. M.
Martin
,
Appl. Phys. Lett.
39
,
747
(
1981
).
8.
It has been shown that the midgap level observed by DLTS and optical absorption are different [
K.
Ishida
,
A.
Yahata
, and
T.
Kikuta
,
Jpn. J. Appl. Phys.
24
,
L250
(
1985
)]. Here, we are concerned with the optically detected midgap level, which we call EL2 as was done previously.
9.
D. E. Holmes, K. R. Elliot, R. T. Chen, and C. G. Kirkpatrick, in Semi‐insulating III‐V Materials, edited by S. Makram‐Ebeid and B. Tuck (Shiva, England, 1982), p. 19.
10.
M. S.
Skolnick
,
M. R.
Brozel
,
L. T.
Reed
,
I.
Grant
,
D. J.
Stirland
, and
R. M.
Ware
,
J. Electron. Mater.
13
,
107
(
1984
).
11.
M. R.
Brozel
,
T.
Grant
,
R. M.
Ware
, and
D. J.
Stirland
,
Appl. Phys. Lett.
42
,
610
(
1983
).
12.
U. Kaufmann, J. Windsceif, M. Baeumler, J. Schneider, and F. Kohl, in The Semi‐insulating III‐V Materials, edited by D. C. Look and J. S. Blake‐more (Shiva, England, 1984), p. 246.
13.
T.
Katsumata
and
T.
Fukuda
,
Rev. Sci. Instrum.
57
,
202
(
1986
).
14.
T. Katsumata, M. Nakajima, T. Obokata, and T. Fukuda, Materials Science Monographs, edited by J. P. Fillard (Elsevier, Amsterdam, 1985), Vol. 31, p. 149.
15.
K.
Terashima
,
T.
Katsumata
,
F.
Orito
, and
T.
Fukuda
,
Jpn. J. Appl. Phys.
23
,
L302
(
1984
).
16.
K.
Ishida
,
A.
Yahata
, and
T.
Kikuta
,
Jpn. J. Appl. Phys.
24
,
L250
(
1985
).
17.
D. E. Holmes, H. Kuwamoto, C. G. Kirkpatrick, and R. T. Chen, in Semi‐insulating III‐V Materials, edited by D. C. Look and J. S. Blakemore (Shiva, England, 1984), p. 204.
18.
A. S.
Jordan
,
R.
Caruso
, and
A. R.
Von Neida
,
Bell Syst. Tech. J.
59
,
593
(
1980
).
19.
T.
Shimada
,
K.
Terashima
,
H.
Nakajima
, and
T.
Fukuda
,
Jpn. J. Appl. Phys.
23
,
L23
(
1984
).
20.
J. A.
Burton
,
R. C.
Prim
, and
W. P.
Slichter
,
J. Chem. Phys.
21
,
1987
(
1953
).
21.
W. G.
Cochran
,
Proc. Cambridge Phil. Soc.
30
,
365
(
1934
).
22.
S.
Chandrasekhar
,
Philos. Mag.
43
,
501
(
1953
).
23.
H. Okada, T. Katsumata, T. Inada, M. Nakajima, T. Obokata, and T. Fukuda, in Gettering and Defect Engineering in the Semiconductor Technology, edited by H. Richter (Academy of Sciences, East Germany, 1985), p. 325.
24.
T. Kimura, T. Katsumata, M. Nakajima, and T. Fukuda, J. Cryst. Growth (to be published).
25.
R. M.
Logan
and
D. T. J.
Hurle
,
J. Phys. Chem. Solids
32
,
1739
(
1971
).
26.
D. T. J.
Hurle
,
J. Phys. Chem. Solids
40
,
613
(
1979
).
27.
T.
Ikoma
and
Y.
Mochizuki
,
Jpn. J. Appl. Phys.
24
,
L935
(
1985
).
28.
J.
Lagowski
,
H. C.
Gatos
,
J. M.
Parsey
,
K.
Wada
,
M.
Kaminska
, and
W.
Walukiewicz
,
Appl. Phys. Lett.
40
,
342
(
1982
).
29.
T.
Obokata
,
T.
Katsumata
, and
T.
Fukuda
,
Jpn. J. Appl. Phys.
24
,
L785
(
1985
).
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