The temperature dependence of the threshold current Ith has been measured for (GaAl)As v‐channeled substrate inner stripe lasers emitting in the wavelength range of 781–697 nm. Ith (350 K)/Ith (300 K) is found to increase below 750 nm with decreasing wavelength in spite of the fairly large heterojunction step height Δx of 0.4. This is well explained by the model of carrier leakage due to unconfined carriers in the active layer. The calculation indicates that the threshold‐temperature sensitivity below 750 nm is almost determined by the carrier leakage in the cladding layer when Δx is smaller than ∼0.4, and it is determined by the temperature dependence of the fraction of the total electrons in the direct conduction band of the active layer when Δx is larger than ∼0.6.
Skip Nav Destination
Article navigation
June 1983
Research Article|
June 01 1983
Threshold‐temperature characteristics in (GaAl)As visible laser diodes emitting below 750 nm Available to Purchase
T. Hayakawa;
T. Hayakawa
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
Search for other works by this author on:
T. Suyama;
T. Suyama
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
Search for other works by this author on:
S. Yamamoto;
S. Yamamoto
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
Search for other works by this author on:
H. Hayashi;
H. Hayashi
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
Search for other works by this author on:
S. Yano;
S. Yano
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
Search for other works by this author on:
T. Hijikata
T. Hijikata
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
Search for other works by this author on:
T. Hayakawa
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
T. Suyama
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
S. Yamamoto
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
H. Hayashi
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
S. Yano
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
T. Hijikata
Central Research Laboratories, Sharp Corporation, Tenri Nara 632, Japan
J. Appl. Phys. 54, 2983–2986 (1983)
Article history
Received:
December 07 1982
Accepted:
March 04 1983
Citation
T. Hayakawa, T. Suyama, S. Yamamoto, H. Hayashi, S. Yano, T. Hijikata; Threshold‐temperature characteristics in (GaAl)As visible laser diodes emitting below 750 nm. J. Appl. Phys. 1 June 1983; 54 (6): 2983–2986. https://doi.org/10.1063/1.332500
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Re-examination of important defect complexes in silicon: From microelectronics to quantum computing
P. P. Filippatos, A. Chroneos, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.