The atomically thin two-dimensional (2D) transition-metal dichalcogenide (e.g., MoS2) material can withstand large strains up to 11% to change its energy band structure, thereby further tuning its optical, electrical, and other physical properties. However, the slippage of 2D materials on substrate hammers the further strain tuning of the properties of 2D materials. Hereby, a facile three points approach combined with a dry transfer method that can apply uniaxial strain to two-dimensional materials is provided. The slippage of WSe2 on polycarbonate (PC) substrate can be suppressed by thermally annealing WSe2/PC in low pressure Ar atmosphere above 100 °C for 3 h. Straining cycle evolution experiments revealed that the thermal annealing of (1L) WSe2 could suppress slippage from the surface of the PC. The spectral gauge factor of 1L WSe2 is found to be around -60 meV/%. After thermal treatment, WSe2/PC stacking can survive in DI water for at least 24 h without the degradation of the spectral gauge factor. Dome structures are formed after thermal treatments with the interplay of the viscoelasticity and surface tension of the PC and the 0.4% tensile strain on WSe2, and the RMS roughness of WSe2/PC increased from 820 to 1292 pm, indicating that there could be larger lateral friction force to suppress slippage following thermal annealing. Our findings enrich the strain engineering of 2D materials and their device applications.
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28 August 2022
Research Article|
August 25 2022
Straining of atomically thin WSe2 crystals: Suppressing slippage by thermal annealing
Special Collection:
Advances in Multi-Scale Mechanical Characterization
Wenshuai Hu;
Wenshuai Hu
(Investigation, Visualization)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Yabin Wang;
Yabin Wang
(Writing – review & editing)
2
Department of Physics, Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
, Staudtstraße 7, 91058 Erlangen, Germany
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Kexin He;
Kexin He
(Investigation, Visualization)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Xiaolong He;
Xiaolong He
(Investigation, Visualization)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Yan Bai;
Yan Bai
(Investigation)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Chenyang Liu;
Chenyang Liu
(Investigation)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Nan Zhou;
Nan Zhou
(Investigation)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Haolin Wang;
Haolin Wang
(Investigation)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Peixian Li
;
Peixian Li
(Resources)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Xiaohua Ma;
Xiaohua Ma
(Resources)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
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Yong Xie
Yong Xie
a)
(Conceptualization, Data curation, Formal analysis, Funding acquisition, Investigation, Methodology, Project administration, Resources, Software, Supervision, Validation, Visualization, Writing – original draft, Writing – review & editing)
1
Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Advanced Materials and Nanotechnology, Xidian University
, Xi’an 710071, China
a)Author to whom correspondence should be addressed: yxie@xidian.edu.cn
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a)Author to whom correspondence should be addressed: yxie@xidian.edu.cn
Note: This paper is part of the Special Topic on Advances in Multi-Scale Mechanical Characterization.
J. Appl. Phys. 132, 085104 (2022)
Article history
Received:
April 15 2022
Accepted:
August 05 2022
Citation
Wenshuai Hu, Yabin Wang, Kexin He, Xiaolong He, Yan Bai, Chenyang Liu, Nan Zhou, Haolin Wang, Peixian Li, Xiaohua Ma, Yong Xie; Straining of atomically thin WSe2 crystals: Suppressing slippage by thermal annealing. J. Appl. Phys. 28 August 2022; 132 (8): 085104. https://doi.org/10.1063/5.0096190
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