Thermal interface materials (TIMs) used between the chip and the heat spreader play an indispensable role in effective heat removal to ensure the chip's performance and reliability. As they suffer from stresses in practical applications, TIMs need to have high toughness to resist fracture. The notch sensitivity of TIMs is considered an important parameter to evaluate its toughness. However, the notch sensitivity of TIMs is seldom mentioned, and the mechanism to enhance the toughness is still unclear. Here, using polymer-based TIMs consisting of polydimethylsiloxane/aluminum as a model, we specifically investigate notch sensitivity of TIMs and analyze the mechanical mechanism in detail from the macroscopic and microscopic scales. It was found that a transition from notch insensitive to notch sensitive will happen with a notch length of 2.0 mm, which is much higher than typical soft materials, such as hydrogels. We interpret the notch sensitivity of the TIM by finite element analysis at macroscopic scales and the Lake–Thomas theory at microcosmic scales. The relationship between the area of the strain concentration region to the notch length in finite element analysis is in good agreement with the fracture stretch ratio with different notch lengths measured in a uniaxial tensile experiment. This investigation gives an insight into designing notch-insensitivity TIM and understanding their fracture behavior.
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28 December 2022
Research Article|
December 29 2022
Notch sensitivity of polymer-based thermal interface materials Available to Purchase
Linfeng Cai
;
Linfeng Cai
(Conceptualization, Data curation, Investigation, Methodology)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
2
Nano Science and Technology Institute, University of Science and Technology of China
, No. 166 Renai Road, Suzhou 215000, China
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Dongyi He;
Dongyi He
(Data curation)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
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Xu Peng;
Xu Peng
(Software)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
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Jianfeng Fan;
Jianfeng Fan
(Investigation)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
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Shengchang Ding
;
Shengchang Ding
(Resources)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
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Xiangliang Zeng
;
Xiangliang Zeng
(Investigation)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
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Rong Sun;
Rong Sun
(Resources)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
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Linlin Ren;
Linlin Ren
(Formal analysis)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
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Cheng Zhong
;
Cheng Zhong
a)
(Software)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Jibao Lu
;
Jibao Lu
a)
(Software)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Xiaoliang Zeng
Xiaoliang Zeng
a)
(Resources)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Linfeng Cai
1,2
Dongyi He
1
Xu Peng
1
Jianfeng Fan
1
Shengchang Ding
1
Xiangliang Zeng
1
Rong Sun
1
Linlin Ren
1
Cheng Zhong
1,a)
Jibao Lu
1,a)
Xiaoliang Zeng
1,a)
1
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences
, Shenzhen 518055, China
2
Nano Science and Technology Institute, University of Science and Technology of China
, No. 166 Renai Road, Suzhou 215000, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
J. Appl. Phys. 132, 245111 (2022)
Article history
Received:
August 17 2022
Accepted:
November 22 2022
Citation
Linfeng Cai, Dongyi He, Xu Peng, Jianfeng Fan, Shengchang Ding, Xiangliang Zeng, Rong Sun, Linlin Ren, Cheng Zhong, Jibao Lu, Xiaoliang Zeng; Notch sensitivity of polymer-based thermal interface materials. J. Appl. Phys. 28 December 2022; 132 (24): 245111. https://doi.org/10.1063/5.0120832
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