The monoclinic semiconductor GeP is a new class of Group IV–V layered material, and it shows attractive anisotropic optical and electronic properties. In this paper, we investigate the structural and electronic evolution of layered GeP under pressure, using in situ x-ray diffraction, Raman and infrared spectra, and the density functional theory. All characterization methods reveal that the pressure causes two obvious phase changes. One isostructural transition is observed around 6 GPa. Above 21 GPa, another crystalline-to-amorphous transformation is obtained. It is worth noting that the high-pressure amorphous state can be retained at ambient conditions after the pressure is released. In addition, the pressure-induced red-shift of absorbance edge suggests its bandgap decreases with pressure. This result indicates that pressure has a significant effect on GeP. Meanwhile, it also provides a method for obtaining amorphous GeP, which is of interest to the energy storage community as it is a potential anode material for lithium-ion batteries.
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28 April 2022
Research Article|
April 22 2022
Pressure-induced evolution of structure and electronic property of GeP Available to Purchase
Yajun Tao
;
Yajun Tao
1
National Synchrotron Radiation Laboratory, University of Science and Technology of China
, Hefei, Anhui 230029, People's Republic of China
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Shiyu Xie;
Shiyu Xie
1
National Synchrotron Radiation Laboratory, University of Science and Technology of China
, Hefei, Anhui 230029, People's Republic of China
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Tenglong Lu;
Tenglong Lu
2
Institute of Physics, Chinese Academy of Sciences
, Beijing 100190, China
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Chuansheng Hu;
Chuansheng Hu
1
National Synchrotron Radiation Laboratory, University of Science and Technology of China
, Hefei, Anhui 230029, People's Republic of China
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Hengjie Liu;
Hengjie Liu
1
National Synchrotron Radiation Laboratory, University of Science and Technology of China
, Hefei, Anhui 230029, People's Republic of China
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Huanjun Zhang;
Huanjun Zhang
3
School of Physics and Electronic Engineering, Zhengzhou University of Light Industry
, Zhengzhou, Henan 450002, China
4
Henan Key Laboratory of Magnetoelectric Information Functional Materials
, Zhengzhou, Henan 450002, China
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Xuerui Cheng;
Xuerui Cheng
a)
3
School of Physics and Electronic Engineering, Zhengzhou University of Light Industry
, Zhengzhou, Henan 450002, China
4
Henan Key Laboratory of Magnetoelectric Information Functional Materials
, Zhengzhou, Henan 450002, China
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Miao Liu
;
Miao Liu
2
Institute of Physics, Chinese Academy of Sciences
, Beijing 100190, China
5
Songshan Lake Materials Laboratory
, Dongguan, Guangdong 523808, China
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Yajun Tao
1
Shiyu Xie
1
Tenglong Lu
2
Chuansheng Hu
1
Hengjie Liu
1
Huanjun Zhang
3,4
Xuerui Cheng
3,4,a)
Miao Liu
2,5
Zeming Qi
1,a)
1
National Synchrotron Radiation Laboratory, University of Science and Technology of China
, Hefei, Anhui 230029, People's Republic of China
2
Institute of Physics, Chinese Academy of Sciences
, Beijing 100190, China
3
School of Physics and Electronic Engineering, Zhengzhou University of Light Industry
, Zhengzhou, Henan 450002, China
4
Henan Key Laboratory of Magnetoelectric Information Functional Materials
, Zhengzhou, Henan 450002, China
5
Songshan Lake Materials Laboratory
, Dongguan, Guangdong 523808, China
J. Appl. Phys. 131, 165901 (2022)
Article history
Received:
January 24 2022
Accepted:
March 31 2022
Citation
Yajun Tao, Shiyu Xie, Tenglong Lu, Chuansheng Hu, Hengjie Liu, Huanjun Zhang, Xuerui Cheng, Miao Liu, Zeming Qi; Pressure-induced evolution of structure and electronic property of GeP. J. Appl. Phys. 28 April 2022; 131 (16): 165901. https://doi.org/10.1063/5.0086327
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