Flexoelectricity has been shown to be an effective strategy to modulate the polarization configurations, domain structures, and physical properties in nanoscale ferroelectric thin films. However, the relations between the domain switching processes and flexoelectric effects remain elusive, which is essential for the design of nanoscale ferroelectric electric devices. In this work, strain-gradient and normal PbTiO3 films are fabricated and investigated to resolve this elusive relationship. By using large-scale and local piezoelectric force microscopy characterization, the ferroelectric domain switching in strain-gradient PbTiO3 films is found to be hard and hindered under applied electric fields compared with the normal ones. Successive atomic-scale scanning transmission electron microscopy imaging analysis manifests that the domains in the strain-gradient PbTiO3 films are stabilized by an additional effective strain gradient-induced flexoelectric field, which was introduced by negative pressure originated from vertically distributed Pb-rich anti-phase domains. This study proposes an effective method to stabilize the ferroelectric polarization in nanoscale ferroelectric films, thus facilitate improving the reliability of ferroelectric electronic devices.
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Influence of flexoelectric effects on domain switching in ferroelectric films
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14 May 2021
Research Article|
May 14 2021
Influence of flexoelectric effects on domain switching in ferroelectric films
Special Collection:
Trends in Flexoelectricity
M. J. Zou;
M. J. Zou
1
Songshan Lake Materials Laboratory
, Dongguan, Guangdong 523808, China
2
Institute of Physics, Chinese Academy of Sciences
, Beijing 100190, China
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Y. L. Tang
;
Y. L. Tang
3
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences
, Wenhua Road 72, Shenyang 110016, China
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Y. P. Feng;
Y. P. Feng
1
Songshan Lake Materials Laboratory
, Dongguan, Guangdong 523808, China
2
Institute of Physics, Chinese Academy of Sciences
, Beijing 100190, China
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W. R. Geng;
W. R. Geng
1
Songshan Lake Materials Laboratory
, Dongguan, Guangdong 523808, China
2
Institute of Physics, Chinese Academy of Sciences
, Beijing 100190, China
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X. L. Ma
;
X. L. Ma
3
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences
, Wenhua Road 72, Shenyang 110016, China
4
State Key Lab of Advanced Processing and Recycling on Non-ferrous Metals, Lanzhou University of Technology
, Langongping Road 287, Lanzhou 730050, China
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Y. L. Zhu
Y. L. Zhu
a)
1
Songshan Lake Materials Laboratory
, Dongguan, Guangdong 523808, China
3
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences
, Wenhua Road 72, Shenyang 110016, China
a)Author to whom correspondence should be addressed: ylzhu@imr.ac.cn
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a)Author to whom correspondence should be addressed: ylzhu@imr.ac.cn
Note: This paper is part of the Special Topic on Trends in Flexoelectricity.
J. Appl. Phys. 129, 184103 (2021)
Article history
Received:
February 23 2021
Accepted:
April 29 2021
Citation
M. J. Zou, Y. L. Tang, Y. P. Feng, W. R. Geng, X. L. Ma, Y. L. Zhu; Influence of flexoelectric effects on domain switching in ferroelectric films. J. Appl. Phys. 14 May 2021; 129 (18): 184103. https://doi.org/10.1063/5.0048535
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