For approximately a decade, imaging ellipsometers have been available commercially. These allow one to measure the properties of graphene flakes, organic layers on amorphous substrates, plasmonic structures, among many other examples. These imaging ellipsometers opened a path to recognize and interpret pattern formations on surfaces or mapping field enhancement. However, for a full understanding of the optical response of patterned substrates, one should be aware that the well-known Fresnel reflection and transmission equations are, strictly speaking, not correct anymore. In this contribution, the ellipsometric response is explained in detail using heuristic physical arguments, hopefully without getting lost in the complexities of numerical computations.
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21 March 2021
Research Article|
March 15 2021
Imaging ellipsometry for structured and plasmonic materials
Special Collection:
Plasmonics: Enabling Functionalities with Novel Materials
Kurt Hingerl
Kurt Hingerl
a)
Center for Surface and Nanoanalytics, Johannes Kepler Universität Linz
, 4040 Linz, Austria
a)Author to whom correspondence should be addressed: kurt.hingerl@jku.at
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a)Author to whom correspondence should be addressed: kurt.hingerl@jku.at
Note: This paper is part of the Special Topic on Plasmonics: Enabling Functionalities with Novel Materials.
J. Appl. Phys. 129, 113101 (2021)
Article history
Received:
November 30 2020
Accepted:
February 24 2021
Citation
Kurt Hingerl; Imaging ellipsometry for structured and plasmonic materials. J. Appl. Phys. 21 March 2021; 129 (11): 113101. https://doi.org/10.1063/5.0039150
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