The layered van der Waals compounds ()() were recently established as the first intrinsic magnetic topological insulators. We report a study on the epitaxial growth of films based on the co-deposition of MnTe and on (111) substrates. X-ray diffraction and scanning transmission electron microscopy evidence the formation of multilayers of stacked septuple layers and quintuple layers with a predominance of . The elemental composition and morphology of the films is further characterized by x-ray photoemission spectroscopy and atomic force microscopy. X-ray magnetic circular and linear dichroism spectra are comparable to those obtained for single crystals and confirm antiferromagnetic order in the films.
Molecular beam epitaxy of antiferromagnetic (MnBi2Te4)(Bi2Te3) thin films on BaF2 (111)
P. Kagerer, C. I. Fornari, S. Buchberger, S. L. Morelhão, R. C. Vidal, A. Tcakaev, V. Zabolotnyy, E. Weschke, V. Hinkov, M. Kamp, B. Büchner, A. Isaeva, H. Bentmann, F. Reinert; Molecular beam epitaxy of antiferromagnetic (MnBi2Te4)(Bi2Te3) thin films on BaF2 (111). J. Appl. Phys. 7 October 2020; 128 (13): 135303. https://doi.org/10.1063/5.0025933
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