Room-temperature operation of near-infrared light-emitting diode based on Tm-doped GaN with ultra-stable emission wavelength Available to Purchase

Near-infrared (NIR) light with a wavelength of 650–950 nm is used for various biomedical applications. Although NIR emitters are typically based on GaAs-related materials, they contain toxic elements, and the emission wavelength can easily shift during the device operation due to temperature changes and current injection levels. On the other hand, Tm$3+$⁠, which is one of the rare-earth ions, can generate ultra-stable NIR luminescence with a wavelength of $∼800nm$⁠, based on $3H4–3H6$ transitions in a 4f shell, and we have recently focused on Tm-doped GaN (GaN:Tm) based light-emitting diodes (LEDs) as novel NIR emitters. In this paper, we present a demonstration of a NIR-LED based on GaN:Tm grown by the organometallic vapor phase epitaxy method with optimized growth conditions and structures, where the parasitic reaction is well suppressed. NIR luminescence from the GaN:Tm-based LED is derived from $3H4–3H6$ transitions of Tm$3+$ ions and consists of three dominant peaks at 795, 806, and 814 nm. The turn-on voltage of the NIR-LED is $∼6.9$ V, and it is significantly lower than the previously reported electroluminescent devices based on GaN:Tm with impact ionization processes. From a current dependence of the electroluminescence spectra and temperature-dependent photoluminescence for the NIR-LED, the peak shifts are determined to be $<7.6$ pm/mA and $∼1.3$ pm/K, respectively.