We present experimental and theoretical results on electronic structure, galvanomagnetic, and thermoelectric properties (Hall coefficient, electrical resistivity, and Seebeck coefficient) of (, Ni; –0.1) compounds at temperatures from 80 K to 800 K. CoSi is a long known promising thermoelectric semimetal. Recently, it was shown that CoSi and the CoSi-based alloys belong to the family of materials with a topologically nontrivial electronic structure. We discuss possible connection of the observed dependences of the transport properties on temperature and alloy composition with ab initio electronic structure of the compounds. The electronic structure was calculated using density functional theory, and transport properties were analyzed in constant relaxation time, as well as in more realistic energy-dependent relaxation time approximations.
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28 December 2019
Research Article|
December 26 2019
Thermoelectric and galvanomagnetic properties of topologically non-trivial (Co-M)Si semimetals (M = Fe, Ni) at high temperatures
Special Collection:
Advanced Thermoelectrics
A. Antonov;
A. Antonov
Ioffe Institute
, Saint-Petersburg 194021, Russia
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Yu. Ivanov
;
Yu. Ivanov
Ioffe Institute
, Saint-Petersburg 194021, Russia
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P. Konstantinov;
P. Konstantinov
Ioffe Institute
, Saint-Petersburg 194021, Russia
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V. Kuznetsova;
V. Kuznetsova
Ioffe Institute
, Saint-Petersburg 194021, Russia
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S. Novikov
;
S. Novikov
Ioffe Institute
, Saint-Petersburg 194021, Russia
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A. Ovchinnikov;
A. Ovchinnikov
Ioffe Institute
, Saint-Petersburg 194021, Russia
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D. Pshenay-Severin
;
D. Pshenay-Severin
Ioffe Institute
, Saint-Petersburg 194021, Russia
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Note: This paper is part of the special topic on Advanced Thermoelectrics.
J. Appl. Phys. 126, 245103 (2019)
Article history
Received:
July 11 2019
Accepted:
December 07 2019
Citation
A. Antonov, Yu. Ivanov, P. Konstantinov, V. Kuznetsova, S. Novikov, A. Ovchinnikov, D. Pshenay-Severin, A. Burkov; Thermoelectric and galvanomagnetic properties of topologically non-trivial (Co-M)Si semimetals (M = Fe, Ni) at high temperatures. J. Appl. Phys. 28 December 2019; 126 (24): 245103. https://doi.org/10.1063/1.5119209
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