We study the magnetotransport properties along the interface of various epitaxial (001) GaP/Si heterostructures of different interface morphologies. The samples are grown by metal-organic vapor-phase epitaxy exploring different approaches for optimizing the interface for device applications. We apply magnetic fields up to 10 T and temperatures between 1.5 and 300 K in the measurement. We alternate Ar-ion-beam etching for reducing the thickness of the GaP layer and transport measurements in order to distinguish transport paths in the bulk of the materials and at the interface. The transport behavior is correlated with structural properties obtained by secondary ion mass spectroscopy, atomic-force microscopy, and scanning transmission electron microscopy. We find a conducting path along the interface that correlates with the formation of antiphase boundaries at the interface.

1.
Yole Développement
, “Silicon photonics report,” 2016.
2.
Nat. Photonics
12,
311
(
2018
) (Editorial).
3.
T.
Komljenovic
,
M.
Davenport
,
J.
Hulme
,
A. Y.
Liu
,
C. T.
Santis
,
A.
Spott
,
S.
Srinivasan
,
E. J.
Stanton
,
C.
Zhang
, and
J. E.
Bowers
,
J. Lightwave Technol.
34
,
20
35
(
2016
).
4.
D.
Shimura
,
T.
Horikawa
,
H.
Okayama
,
S.-H.
Jeong
,
M.
Tokushima
,
H.
Sasaki
, and
T.
Mogami
, in 11th International Conference on Group IV Photonics (GFP) (IEEE, 2014).
5.
K.
Volz
,
A.
Beyer
,
W.
Witte
,
J.
Ohlmann
,
I.
Németh
,
B.
Kunert
, and
W.
Stolz
,
J. Cryst. Growth
315
,
37
(
2011
).
6.
E. L.
Warren
,
A. E.
Kibbler
,
R. M.
France
,
A. G.
Norman
,
P.
Stradins
, and
W. E.
McMahon
,
Appl. Phys. Lett.
107
,
082109
(
2015
).
7.
8.
A.
Beyer
,
I.
Németh
,
S.
Liebich
,
J.
Ohlmann
,
W.
Stolz
, and
K.
Volz
,
J. Appl. Phys.
109
,
83529
(
2011
).
9.
A.
Beyer
,
A.
Stegmüller
,
J. O.
Oelerich
,
K.
Jandieri
,
K.
Werner
,
G.
Mette
,
W.
Stolz
,
S. D.
Baranovskii
,
R.
Tonner
, and
K.
Volz
,
Chem. Mater.
28
,
3265
(
2016
).
10.
A.
Beyer
and
K.
Volz
,
Adv. Mater. Interfaces
6
,
1801951
(
2019
).
11.
A.
Milnes
and
D.
Feucht
,
Heterojunctions and Metal Semiconductor Junctions
(
Elsevier
,
1972
).
12.
W. R.
Frensley
and
H.
Kroemer
,
Phys. Rev. B
16
,
2642
(
1977
).
13.
W. A.
Harrison
,
J. Vac. Sci. Technol.
14
,
1016
(
1977
).
14.
J. L.
Freeouf
and
J. M.
Woodall
,
Appl. Phys. Lett.
39
,
727
(
1981
).
15.
16.
W. A.
Harrison
and
J.
Tersoff
,
J. Vac. Sci. Technol. B
4
,
1068
(
1986
).
17.
C. G. V.
de Walle
and
R. M.
Martin
,
Phys. Rev. B
35
,
8154
(
1987
).
18.
M.
Cardona
and
N. E.
Christensen
,
Phys. Rev. B
35
,
6182
(
1987
).
19.
N. E.
Christensen
,
Phys. Rev. B
37
,
4528
(
1988
).
20.
C. G. V.
de Walle
,
Phys. Rev. B
39
,
1871
(
1989
).
21.
W. R. L.
Lambrecht
,
B.
Segall
, and
O. K.
Andersen
,
Phys. Rev. B
41
,
2813
(
1990
).
22.
W. R. L.
Lambrecht
and
B.
Segall
,
Phys. Rev. B
41
,
2832
(
1990
).
23.
C. G. V.
de Walle
and
J.
Neugebauer
,
Nature
423
,
626
(
2003
).
24.
G.
Zeidenbergs
and
R.
Anderson
,
Solid-State Electron.
10
,
113
(
1967
).
25.
T.
Katoda
and
M.
Kishi
,
J. Electronic Mater.
9
, 783 (
1980
).
26.
A. D.
Katnani
and
G.
Margaritondo
,
Phys. Rev. B
28
,
1944
(
1983
).
27.
P.
Perfetti
,
F.
Patella
,
F.
Sette
,
C.
Quaresima
,
C.
Capasso
,
A.
Savoia
, and
G.
Margaritondo
,
Phys. Rev. B
29
,
5941
(
1984
).
28.
P.
Perfetti
,
F.
Patella
,
F.
Sette
,
C.
Quaresima
,
C.
Capasso
,
A.
Savoia
, and
G.
Margaritondo
,
Phys. Rev. B
30
,
4533
(
1984
).
29.
I.
Sakata
and
H.
Kawanami
,
Appl. Phys. Express
1
,
091201
(
2008
).
30.
I.
Németh
,
B.
Kunert
,
W.
Stolz
, and
K.
Volz
,
J. Cryst. Growth
310
,
1595
(
2008
).
31.
D.
Kendall
and
D. D.
Vries
, “Diffusion in silicon,” in Semiconductor Silicon (The Electrochemical Society Softbound Series, 1969).
32.
R. B.
Fair
,
Impurity Doping Processes Silicon
(Elsevier,
1981
), Vol. 2, pp. 315–442.
33.
M.
Darnon
,
R.
Varache
,
M.
Descazeaux
,
T.
Quinci
,
M.
Martin
,
T.
Baron
, and
D.
Muñoz
,
AIP Conf. Proc.
1679
,
040003
(
2015
).
34.
M.
Feifel
,
T.
Rachow
,
J.
Benick
,
J.
Ohlmann
,
S.
Janz
,
M.
Hermle
,
F.
Dimroth
, and
D.
Lackner
,
IEEE J. Photovoltaics
6
,
384
(
2016
).
35.
36.
B. I.
Shklovskii
and
A. L.
Efros
,
Electronic Properties of Doped Semiconductors
(
Springer
,
Berlin
,
1984
).
37.
O. N.
Tufte
and
E. L.
Stelzer
,
Phys. Rev.
139
,
A265
(
1965
).
You do not currently have access to this content.