We study the magnetotransport properties along the interface of various epitaxial (001) GaP/Si heterostructures of different interface morphologies. The samples are grown by metal-organic vapor-phase epitaxy exploring different approaches for optimizing the interface for device applications. We apply magnetic fields up to 10 T and temperatures between 1.5 and 300 K in the measurement. We alternate Ar-ion-beam etching for reducing the thickness of the GaP layer and transport measurements in order to distinguish transport paths in the bulk of the materials and at the interface. The transport behavior is correlated with structural properties obtained by secondary ion mass spectroscopy, atomic-force microscopy, and scanning transmission electron microscopy. We find a conducting path along the interface that correlates with the formation of antiphase boundaries at the interface.
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7 December 2019
Research Article|
December 04 2019
Effect of the interface morphology on the lateral electron transport in (001) GaP/Si heterostructures
L. Ostheim
;
L. Ostheim
a)
1
Institute of Experimental Physics I and Center of Materials Research (ZfM/LaMa), Justus Liebig University
, 35392 Giessen, Germany
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P. J. Klar
;
P. J. Klar
1
Institute of Experimental Physics I and Center of Materials Research (ZfM/LaMa), Justus Liebig University
, 35392 Giessen, Germany
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Y. Moryson;
Y. Moryson
2
Institute of Physical Chemistry and Center of Materials Research (ZfM/LaMa), Justus Liebig University
, 35392 Giessen, Germany
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M. Rohnke
;
M. Rohnke
2
Institute of Physical Chemistry and Center of Materials Research (ZfM/LaMa), Justus Liebig University
, 35392 Giessen, Germany
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A. Beyer
;
A. Beyer
3
Department of Physics and Material Sciences Center, Philipps University Marburg
, 35032 Marburg, Germany
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M. Volk
;
M. Volk
3
Department of Physics and Material Sciences Center, Philipps University Marburg
, 35032 Marburg, Germany
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M. Munde;
M. Munde
3
Department of Physics and Material Sciences Center, Philipps University Marburg
, 35032 Marburg, Germany
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W. Stolz;
W. Stolz
3
Department of Physics and Material Sciences Center, Philipps University Marburg
, 35032 Marburg, Germany
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K. Volz
K. Volz
3
Department of Physics and Material Sciences Center, Philipps University Marburg
, 35032 Marburg, Germany
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J. Appl. Phys. 126, 215704 (2019)
Article history
Received:
August 10 2019
Accepted:
November 21 2019
Citation
L. Ostheim, P. J. Klar, Y. Moryson, M. Rohnke, A. Beyer, M. Volk, M. Munde, W. Stolz, K. Volz; Effect of the interface morphology on the lateral electron transport in (001) GaP/Si heterostructures. J. Appl. Phys. 7 December 2019; 126 (21): 215704. https://doi.org/10.1063/1.5124049
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