Mechanical micro- and nano-patterning processes rely on engineering the interactions between a stamp and a substrate to accommodate surface roughness and particle defects while retaining the geometric integrity of printed features. We introduce a set of algorithms for rapidly simulating the stamp–substrate contact, and we use them to show that advantageous behavior can occur when the stamp consists of a finite-thickness layer bonded to a layer with different elastic properties. The simulations use two-dimensional load-response functions describing in discrete space the response of a stamp surface's shape to a localized unit load. These load-response functions incorporate the contributions both of local, indentation-like displacements and of plate-like bending of finite-thickness stamp layers. The algorithms solve iteratively for contact pressure distributions that, when spatially convolved with the load response, yield deformations consistent with the properties of the stamp and the substrate. We investigate three determinants of stamp performance: conformation to sinusoidal substrate topographies, distortion of material around stamp protrusions, and conformation to isolated spherical dust particles trapped between the stamp and the substrate. All simulation results are encapsulated in dimensionless models that can be applied to the efficient selection of stamp geometries, materials, and loading conditions. A particularly striking finding is that a stamp with a finite-thickness compliant coating bonded to a more rigid support can conform more closely to a trapped particle under a given load than a homogeneous stamp with the properties of the coating. This finding could be used to minimize the impact of particle defects on patterning processes.
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A computational design framework for two-layered elastic stamps in nanoimprint lithography and microcontact printing
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7 March 2019
Research Article|
March 06 2019
A computational design framework for two-layered elastic stamps in nanoimprint lithography and microcontact printing

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Hayden Taylor
;
Hayden Taylor
a)
1
Department of Mechanical Engineering, University of California, Berkeley
, 6159 Etcheverry Hall, Berkeley, California 94720-1740, USA
Search for other works by this author on:
Richard O’Rorke
Richard O’Rorke
b)
2
School of Materials Science and Engineering, Nanyang Technological University
, 50 Nanyang Avenue, Singapore
639798
Search for other works by this author on:
Hayden Taylor
1,a)
Richard O’Rorke
2,b)
1
Department of Mechanical Engineering, University of California, Berkeley
, 6159 Etcheverry Hall, Berkeley, California 94720-1740, USA
2
School of Materials Science and Engineering, Nanyang Technological University
, 50 Nanyang Avenue, Singapore
639798a)
E-mail: [email protected]
b)
Now with the Singapore University of Technology and Design.
J. Appl. Phys. 125, 094901 (2019)
Article history
Received:
November 15 2018
Accepted:
January 24 2019
Connected Content
A companion article has been published:
New modeling framework helps tailor designs of micro- and nano-structured stamps
Citation
Hayden Taylor, Richard O’Rorke; A computational design framework for two-layered elastic stamps in nanoimprint lithography and microcontact printing. J. Appl. Phys. 7 March 2019; 125 (9): 094901. https://doi.org/10.1063/1.5081495
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