β-Ga2O3 thin films were grown on the substrates of sapphire, GaN, and single crystals of β-Ga2O3, using plasma-assisted molecular beam epitaxy. By varying deposition conditions, pure-phase epitaxial β-Ga2O3 thin films were obtained, and the crystal quality of the as-grown films was optimized. A systematic characterization and a detailed analysis were performed on the films, including the nucleation process, surface morphology, crystal quality, thermal stability, as well as electrical and optical properties. Optical absorption was investigated using photothermal deflection spectroscopy, which provides detailed information about sub-gap optical absorption. Photocurrent measurements indicated a pronounced persistent photo-conductivity of β-Ga2O3. A blue-UV emission with an energy of 3–3.5 eV was observed by cathodoluminescence spectroscopy. The Fermi level position of the as-grown film was determined based on temperature-dependent electrical conductivity measurements. It is proposed that oxygen vacancies in the film form a defect band at around -0.8 eV that pins the Fermi level and is related to the observed photocurrent and cathodoluminescence characteristics.
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14 March 2019
Research Article|
March 08 2019
Growth and characterization of β-Ga2O3 thin films on different substrates Available to Purchase
S. J. Hao;
S. J. Hao
a)
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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M. Hetzl;
M. Hetzl
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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F. Schuster;
F. Schuster
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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K. Danielewicz;
K. Danielewicz
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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A. Bergmaier;
A. Bergmaier
2
Institut f. Angewandte Physik und Messtechnik (LRT2), Fakultät f. Luft- und Raumfahrttechnik, Universität der Bundeswehr München
, Neubiberg 85577, Germany
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G. Dollinger;
G. Dollinger
2
Institut f. Angewandte Physik und Messtechnik (LRT2), Fakultät f. Luft- und Raumfahrttechnik, Universität der Bundeswehr München
, Neubiberg 85577, Germany
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Q. L. Sai;
Q. L. Sai
3
Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
, Qinghe Road 390, 201800 Shanghai, People’s Republic of China
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C. T. Xia;
C. T. Xia
3
Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
, Qinghe Road 390, 201800 Shanghai, People’s Republic of China
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T. Hoffmann;
T. Hoffmann
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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M. Wiesinger;
M. Wiesinger
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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S. Matich;
S. Matich
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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W. Aigner;
W. Aigner
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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M. Stutzmann
M. Stutzmann
b)
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
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S. J. Hao
1,a)
M. Hetzl
1
F. Schuster
1
K. Danielewicz
1
A. Bergmaier
2
G. Dollinger
2
Q. L. Sai
3
C. T. Xia
3
T. Hoffmann
1
M. Wiesinger
1
S. Matich
1
W. Aigner
1
M. Stutzmann
1,b)
1
Walter Schottky Institut und Physik Department, Technische Universität München
, Garching 85748, Germany
2
Institut f. Angewandte Physik und Messtechnik (LRT2), Fakultät f. Luft- und Raumfahrttechnik, Universität der Bundeswehr München
, Neubiberg 85577, Germany
3
Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
, Qinghe Road 390, 201800 Shanghai, People’s Republic of China
a)
Electronic mail: [email protected]
b)
Electronic mail: [email protected]
J. Appl. Phys. 125, 105701 (2019)
Article history
Received:
September 23 2018
Accepted:
February 05 2019
Citation
S. J. Hao, M. Hetzl, F. Schuster, K. Danielewicz, A. Bergmaier, G. Dollinger, Q. L. Sai, C. T. Xia, T. Hoffmann, M. Wiesinger, S. Matich, W. Aigner, M. Stutzmann; Growth and characterization of β-Ga2O3 thin films on different substrates. J. Appl. Phys. 14 March 2019; 125 (10): 105701. https://doi.org/10.1063/1.5061794
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