In this work, we investigate an unexplored possibility of passivating the charged surface states on AlGaN/GaN high electron mobility transistor (HEMT) heterostructures by using organic molecules. This has further led to remarkable enhancement in the electrical properties of rectifying metal-semiconductor contacts on AlGaN/GaN. Phenol functionalized Zinc metallated-Tetra Phenyl Porphyrin (Zn-TPPOH) organic molecules were adsorbed on AlGaN/GaN via the solution phase to form a molecular layer (MoL). The presence of the MoL was confirmed using X-ray Photoelectron Spectroscopy (XPS). The thickness of the MoL was assessed as ∼1 nm, using Spectroscopic Ellipsometry and cross-sectional Transmission Electron Microscopy. XPS peak-shift analyses together with Kelvin Probe Force Microscopy revealed that the molecular surface modification reduced the surface potential of AlGaN by approximately 250 meV. Consequently, the Barrier height (ideality factor) of Ni Schottky diodes on AlGaN/GaN was increased (reduced) significantly from 0.91 ± 0.05 eV (2.5 ± 0.31) for Ni/AlGaN/GaN to 1.37 ± 0.03 eV (1.4 ± 0.29) for Ni/Zn-TPPOH/AlGaN/GaN. In addition, a noteworthy decrement in the reverse current from 2.6 ± 1.93 μA to 0.31 ± 0.19 nA at −5 V (∼10 000 times) was observed from Current-Voltage (I-V) measurements. This surface-modification process can be fruitful for improving the performance of AlGaN/GaN HEMTs, mitigating the adverse effects of surface states and polarization in these materials.
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21 November 2018
Research Article|
November 19 2018
Effect of surface passivation process for AlGaN/GaN HEMT heterostructures using phenol functionalized-porphyrin based organic molecules
Manjari Garg
;
Manjari Garg
a)
1
Department of Physics, Indian Institute of Technology Delhi
, Hauz Khas, New Delhi 110016, India
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Tejas Rajendra Naik;
Tejas Rajendra Naik
2
Centre of Excellence in Nanoelectronics, Indian Institute of Technology Bombay
, Powai, Mumbai, Maharashtra 400076, India
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Ravi Pathak;
Ravi Pathak
1
Department of Physics, Indian Institute of Technology Delhi
, Hauz Khas, New Delhi 110016, India
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Valipe Ramgopal Rao;
Valipe Ramgopal Rao
3
Department of Electrical Engineering, Indian Institute of Technology Delhi
, Hauz Khas, New Delhi 110016, India
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Che-Hao Liao;
Che-Hao Liao
4
Advanced Semiconductor Laboratory, King Abdullah University of Science and Technology (KAUST),
Thuwal 23955-6900, Saudi Arabia
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Kuang-Hui Li;
Kuang-Hui Li
4
Advanced Semiconductor Laboratory, King Abdullah University of Science and Technology (KAUST),
Thuwal 23955-6900, Saudi Arabia
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Haiding Sun
;
Haiding Sun
4
Advanced Semiconductor Laboratory, King Abdullah University of Science and Technology (KAUST),
Thuwal 23955-6900, Saudi Arabia
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Xiaohang Li
;
Xiaohang Li
4
Advanced Semiconductor Laboratory, King Abdullah University of Science and Technology (KAUST),
Thuwal 23955-6900, Saudi Arabia
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Rajendra Singh
Rajendra Singh
1
Department of Physics, Indian Institute of Technology Delhi
, Hauz Khas, New Delhi 110016, India
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a)
Electronic mail: [email protected]
J. Appl. Phys. 124, 195702 (2018)
Article history
Received:
July 26 2018
Accepted:
October 30 2018
Citation
Manjari Garg, Tejas Rajendra Naik, Ravi Pathak, Valipe Ramgopal Rao, Che-Hao Liao, Kuang-Hui Li, Haiding Sun, Xiaohang Li, Rajendra Singh; Effect of surface passivation process for AlGaN/GaN HEMT heterostructures using phenol functionalized-porphyrin based organic molecules. J. Appl. Phys. 21 November 2018; 124 (19): 195702. https://doi.org/10.1063/1.5049873
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