Micro- or nano-structuring is essential in order to use Si as an anode material for lithium ion batteries. In the present study, we attempted to use Si wafers with a spiky microstructure (SMS), the so-called black-Si, prepared by a cryogenic reactive ion etching process with an SF6/O2 gas mixture, for Li half-cells. The SMS with various sizes of spikes from 2.0 μm (height) × 0.2 μm (width) to 21 μm × 1.0 μm was etched by varying the SF6/O2 gas flow ratio. An anode of SMS of 11 μm-height in average showed stable charge/discharge capacity and Coulombic efficiency higher than 99% for more than 300 cycles, causing no destruction to any part of the Si wafer. The spiky structure turned columnar after cycles, suggesting graded lithiation levels along the length. The present results suggest a strategy to utilize a wafer-based Si material for an anode of a lithium ion battery durable against repetitive lithiation/delithiation cycles.
Skip Nav Destination
Cryogenic plasma-processed silicon microspikes as a high-performance anode material for lithium ion-batteries
,
,
,
,
,
,
Article navigation
21 October 2017
Research Article|
October 19 2017
Cryogenic plasma-processed silicon microspikes as a high-performance anode material for lithium ion-batteries
Joe Sakai
;
Joe Sakai
a)
1
GREMAN, UMR 7347 CNRS/Universite´ François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
Search for other works by this author on:
Erwann Luais;
Erwann Luais
1
GREMAN, UMR 7347 CNRS/Universite´ François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
2
PCM2E, EA 6299 Université François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
Search for other works by this author on:
Jérôme Wolfman;
Jérôme Wolfman
1
GREMAN, UMR 7347 CNRS/Universite´ François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
Search for other works by this author on:
Thomas Tillocher;
Thomas Tillocher
3
GREMI, UMR 7344 CNRS/Université d'Orléans
, 14 rue d'Issoudun, B.P. 6744, 45067 Orléans, France
Search for other works by this author on:
Rémi Dussart
;
Rémi Dussart
3
GREMI, UMR 7344 CNRS/Université d'Orléans
, 14 rue d'Issoudun, B.P. 6744, 45067 Orléans, France
Search for other works by this author on:
Francois Tran-Van;
Francois Tran-Van
2
PCM2E, EA 6299 Université François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
Search for other works by this author on:
Fouad Ghamouss
Fouad Ghamouss
2
PCM2E, EA 6299 Université François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
Search for other works by this author on:
Joe Sakai
1,a)
Erwann Luais
1,2
Jérôme Wolfman
1
Thomas Tillocher
3
Rémi Dussart
3
Francois Tran-Van
2
Fouad Ghamouss
2
1
GREMAN, UMR 7347 CNRS/Universite´ François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
2
PCM2E, EA 6299 Université François Rabelais de Tours
, Parc de Grandmont, 37200 Tours, France
3
GREMI, UMR 7344 CNRS/Université d'Orléans
, 14 rue d'Issoudun, B.P. 6744, 45067 Orléans, France
a)
Author to whom correspondence should be addressed: [email protected]
J. Appl. Phys. 122, 155103 (2017)
Article history
Received:
July 26 2017
Accepted:
October 03 2017
Citation
Joe Sakai, Erwann Luais, Jérôme Wolfman, Thomas Tillocher, Rémi Dussart, Francois Tran-Van, Fouad Ghamouss; Cryogenic plasma-processed silicon microspikes as a high-performance anode material for lithium ion-batteries. J. Appl. Phys. 21 October 2017; 122 (15): 155103. https://doi.org/10.1063/1.4997713
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.
Decoding diffraction and spectroscopy data with machine learning: A tutorial
D. Vizoso, R. Dingreville
Related Content
Conical microspike morphology formation and control on various metal surfaces using femtosecond laser pulse
J. Laser Appl. (June 2016)
Silicon electron emitters fabricated by ultraviolet laser pulses
Appl. Phys. Lett. (February 2006)
Optical tweezers with enhanced efficiency based on laser-structured substrates
Appl. Phys. Lett. (July 2012)
Periodic antireflection surface structure fabricated on silicon by four-beam laser interference lithography
J. Laser Appl. (December 2013)
Three-dimensional carbon nanowall field emission arrays
Appl. Phys. Lett. (January 2010)