A method is introduced that allows suppressing unwanted effects of target poisoning during reactive high-power impulse magnetron sputtering (R-HiPIMS) employed for deposition of oxide films. The method, based on higher reactivity of excited/activated oxygen species, is studied and demonstrated on TiO2 films deposited in R-HiPIMS discharge running very close to the metallic mode with a high deposition rate. An external source of energetic plasma that activates oxygen gas, delivered to the vicinity of the substrate, is combined with conventional R-HiPIMS of the Ti target. The activated oxygen species enable reducing the total flow rate, which simultaneously results in suppression of the target poisoning effect. On the other hand, sufficient oxidation and growth of transparent crystalline TiO2 films were observed.
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7 May 2017
Research Article|
March 10 2017
Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode
V. Stranak;
V. Stranak
1Institute of Physics and Biophysics,
University of South Bohemia
, Branisovska 31, 37005 Ceske Budejovice, Czech Republic
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J. Kratochvil
;
J. Kratochvil
1Institute of Physics and Biophysics,
University of South Bohemia
, Branisovska 31, 37005 Ceske Budejovice, Czech Republic
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J. Olejnicek;
J. Olejnicek
2Institute of Physics,
Academy of Science of the Czech Republic
, Na Slovance 2, 18221 Prague, Czech Republic
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P. Ksirova;
P. Ksirova
2Institute of Physics,
Academy of Science of the Czech Republic
, Na Slovance 2, 18221 Prague, Czech Republic
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P. Sezemsky;
P. Sezemsky
1Institute of Physics and Biophysics,
University of South Bohemia
, Branisovska 31, 37005 Ceske Budejovice, Czech Republic
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M. Cada
;
M. Cada
2Institute of Physics,
Academy of Science of the Czech Republic
, Na Slovance 2, 18221 Prague, Czech Republic
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Z. Hubicka
Z. Hubicka
2Institute of Physics,
Academy of Science of the Czech Republic
, Na Slovance 2, 18221 Prague, Czech Republic
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J. Appl. Phys. 121, 171914 (2017)
Article history
Received:
October 26 2016
Accepted:
February 08 2017
Citation
V. Stranak, J. Kratochvil, J. Olejnicek, P. Ksirova, P. Sezemsky, M. Cada, Z. Hubicka; Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode. J. Appl. Phys. 7 May 2017; 121 (17): 171914. https://doi.org/10.1063/1.4977825
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