A method is introduced that allows suppressing unwanted effects of target poisoning during reactive high-power impulse magnetron sputtering (R-HiPIMS) employed for deposition of oxide films. The method, based on higher reactivity of excited/activated oxygen species, is studied and demonstrated on TiO2 films deposited in R-HiPIMS discharge running very close to the metallic mode with a high deposition rate. An external source of energetic plasma that activates oxygen gas, delivered to the vicinity of the substrate, is combined with conventional R-HiPIMS of the Ti target. The activated oxygen species enable reducing the total flow rate, which simultaneously results in suppression of the target poisoning effect. On the other hand, sufficient oxidation and growth of transparent crystalline TiO2 films were observed.
References
1.
N.
Britun
, T.
Minea
, S.
Konstantinidis
, and R.
Snyders
, J. Phys. D: Appl. Phys.
47
, 224001
(2014
).2.
K.
Sarakinos
, J.
Alami
, and S.
Konstantinidis
, Surf. Coat. Technol.
204
, 1661
(2010
).3.
J. T.
Gudmundsson
, N.
Brenning
, D.
Lundin
, and U.
Helmersson
, J. Vac. Sci. Technol. A
30
(3
), 030801
(2012
).4.
V.
Stranak
, A-P.
Herendorf
, S.
Drache
, M.
Cada
, Z.
Hubicka
et al, Appl. Phys. Lett.
100
, 141604
(2012
).5.
V.
Stranak
, Z.
Hubicka
, M.
Cada
, S.
Drache
, M.
Tichy
, and R.
Hippler
, J. Appl. Phys.
115
, 153301
(2014
).6.
U.
Helmersson
, M.
Lattemann
, J.
Bohlmark
, A. P.
Ehiasarian
, and J. T.
Gudmundsson
, Thin Solid Films
513
, 1
(2006
).7.
A. P.
Ehiasarian
, J. G.
Wen
, and I.
Petrov
, J. Appl. Phys.
101
, 054301
(2007
).8.
V.
Stranak
, AP.
Herendorf
, H.
Wulff
et al, Surf. Coat. Technol.
222
, 112
(2013
).9.
S.
Konstantinidis
, J. P.
Dauchot
, and M.
Hecq
, Thin Solid Films
515
, 1182
(2006
).10.
J.
Rezek
, J.
Vlcek
, J.
Houska
, and R.
Cerstvy
, Thin Solid Films
566
, 70
(2014
).11.
R.
Dodd
, S. D.
You
, and J. W.
Bradley
, Thin Solid Films
519
, 1705
(2010
).12.
M.
Bowes
, P.
Poolcharuansin
, and J. W.
Bradley
, J. Phys. D: Appl. Phys.
46
, 045204
(2013
).13.
V.
Stranak
, J.
Blazek
, S.
Wrehde
et al, Contrib. Plasma Phys.
48
, 503
(2008
).14.
I.
Safi
, Surf. Coat. Technol.
127
, 203
(2000
).15.
M.
Aiempanakit
, T.
Kubart
, P.
Larson
, K.
Sarakinos
, J.
Jensen
, and U.
Helmersson
, Thin Solid Films
519
, 7779
(2011
).16.
S.
Berg
and T.
Nyberg
, Thin Solid Films
476
, 215
(2005
).17.
D.
Depla
, S.
Heirwegh
, S.
Mahieu
, and R.
De Gryse
, J. Phys. D: Appl. Phys.
40
, 1957
(2007
).18.
K.
Ellmer
, in Low Temperature Plasmas
, edited by R.
Hippler
, H.
Kersten
, M.
Schmidt
, and K. H.
Schoenbach
(Wiley-VCH
, Weinheim
, 2009
), Vol. 2
.19.
V.
Stranak
, M.
Quass
, R.
Bogdanowicz
et al, J. Phys. D: Appl. Phys.
43
, 285203
(2010
).20.
M.
Audronis
and V.
Bellindo-Gonzalez
, Surf. Coat. Technol.
205
, 3613
(2011
).21.
S.
Kadlec
, J.
Musil
, and J.
Vyskocil
, Vacuum
37
, 729
(1987
).22.
T.
Nyberg
, S.
Berg
, U.
Helmersson
, and K.
Hartig
, Appl. Phys. Lett.
86
, 164106
(2005
).23.
T.
Kubart
, D.
Depla
, DM.
Martin
, T.
Nyberg
, and S.
Berg
, Appl. Phys. Lett.
92
, 221501
(2008
).24.
D.
Severin
, O.
Kappertz
, T.
Kubart
, T.
Nyberg
, S.
Berg
et al, Appl. Phys. Lett.
88
, 161504
(2006
).25.
W. D.
Sproul
, D. J.
Christie
, and D. C.
Carter
, Thin Solid Films
491
, 1
(2005
).26.
M.
Audronis
, V.
Bellindo-Gonzalez
, and B.
Daniel
, Surf. Coat. Technol.
204
, 2159
(2010
).27.
E.
Wallin
and U.
Helmersson
, Thin Solid Films
516
, 6398
(2008
).28.
K.
Sarakinos
, J.
Alami
, C.
Klever
, and M.
Wuttig
, Surf. Coat. Technol.
202
, 5033
(2008
).29.
S.
Schiller
, G.
Beister
, E.
Buedke
, H. J.
Becker
, and H.
Schicht
, Thin Solid Films
96
, 113
(1982
).30.
J.
Vlcek
, J.
Rezek
, J.
Houska
, R.
Cerstvy
, and R.
Bugyi
, Surf. Coat. Technol.
236
, 550
(2013
).31.
J.
Vlcek
, J.
Rezek
, J.
Houska
, T.
Kozak
, and J.
Kohout
, Vacuum
114
, 131
(2015
).32.
A.
Fujishima
, X.
Zhang
, and D. A.
Tryk
, Surf. Sci. Rep.
63
, 515
(2008
).33.
R.
Bogdanowicz
, M.
Smietana
, M.
Gnyba
et al, Phys. Status Solidi A
210
, 1991
(2013
).34.
N.
Britun
, S.
Konstantinidis
, and R.
Snyder
, Plasma Processes Polym.
12
, 1010
(2015
).35.
C.
Vitelaru
, D.
Lundin
, N.
Brenning
, and T.
Minea
, Appl. Phys. Lett.
103
, 104105
(2013
).36.
Y.
Schimazu
, T.
Okumura
, E.
Sakai
et al, Jpn. J. Appl. Phys., Part 1
53
, 06JG01
(2014
).37.
S.
Konstantinidis
and R.
Snyders
, Eur. Phys. J.: Appl. Phys.
56
, 24002
(2011
).38.
P.
Poolcharuansin
, B.
Liebig
, and J.
Bradley
, IEEE Trans. Plasma. Sci.
38
, 3007
(2010
).39.
A.
Anders
and G. Y.
Yushkov
, J. Appl. Phys.
105
, 073301
(2009
).40.
M.
Ganciu
, S.
Konstantinidis
, Y.
Paint
, J. P.
Dauchot
, M.
Hecq
et al, J. Opt. Adv. Mater.
7
, 2481
(2005
).41.
K.
Kutasi
, V.
Guerra
, and P. A.
Sa
, Plasma Sources Sci. Technol.
20
, 035006
(2011
).42.
43.
V.
Stranak
, P.
Adamek
, J.
Blazek
, M.
Tichy
, and P.
Spatenka
, Contrib. Plasma Phys.
46
, 439
(2006
).44.
S.
Pfau
and M.
Tichy
, “Langmuir probe diagnostics
,” in Low Temperature Plasmas
, edited by R.
Hippler
, H.
Kersten
, M.
Schmidt
, and K.-H.
Schoenbach
(Wiley-VCH
, Berlin
, 2008
).45.
M.
Aiempanakit
, A.
Aijaz
, D.
Lundin
, U.
Helmersson
, and T.
Kubart
, J. Appl. Phys.
113
, 133302
(2013
).46.
J. T.
Gudmundsson
, D.
Lundin
, N.
Brenning
, M. A.
Raadu
, C.
Huo
, and T. M.
Minea
, Plasma Sources Sci. Technol.
25
, 65004
(2016
).47.
D.
Lundin
, N.
Brenning
, D.
Jadernas
, P.
Larsson
, E.
Wallin
, M.
Lattemann
, M. A.
Raadu
, and U.
Helmersson
, Plasma Sources Sci. Technol.
18
, 045008
(2009
).48.
C.
Huo
, M. A.
Raadu
, D.
Lundin
, J. T.
Gudmundsson
, A.
Anders
, and N.
Brenning
, Plasma Sources Sci. Technol.
21
, 045004
(2012
).49.
S.
Panda
, D. J.
Economou
, and M.
Meyyappan
, J. Appl. Phys.
87
, 8323
(2000
).50.
S.
Scribbins
, M.
Bowes
, and J. W.
Bradley
, J. Phys. D: Appl. Phys.
46
, 045203
(2013
).51.
M.
Cada
, Z.
Hubicka
, P.
Adamek
, J.
Kluson
, and L.
Jastrabik
, Surf. Coat. Technol.
205
, S317
(2011
).52.
A.
Anders
, Thin Solid Films
518
, 4087
(2010
).53.
J. A.
Thornton
, J. Vac. Sci. Technol.
11
, 666
(1974
).54.
N.
Martin
, C.
Russelot
, D.
Rondot
, F.
Palmino
, and R.
Mercier
, Thin Solid Films
300
, 113
(1997
).55.
A.
Hecimovic
and A. P.
Ehiasarian
, J. Appl. Phys.
108
, 063301
(2010
).56.
D.
Lundin
, P.
Larsson
, E.
Wallin
, M.
Lattemann
, N.
Brenning
, and U.
Helmerson
, Plasma Sources Sci. Technol.
17
, 035021
(2008
).57.
M. A.
Ridenti
, J. A.
Sousa-Correa
, and J.
Amorim
, “Study of neutral mass and positive ion energy distributions from atmospheric pressure surfatron Ar plasmas
,” in Proceedings of 30th ICPIG Conference
, Belfast (2010
).© 2017 Author(s).
2017
Author(s)
You do not currently have access to this content.
