Time-resolved optical emission spectroscopy was performed near the sputtered Zr target and in a plasma bulk during a controlled high-rate reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density of 52 W cm−2 with a peak target power density of 1100 W cm−2. The voltage pulse duration was 200 μs. From the time evolutions of the excited-state populations for the chosen atoms (Zr, Ar, and O) and ions (Zr+, Zr2+, Ar+, and O+), and of the excitation temperature during a voltage pulse, the trends in a time evolution of the local ground-state densities of these atoms and ions during the voltage pulse were derived. Near the target, a decrease in the ground-state densities of Ar and O atoms, caused by a gas rarefaction and intense electron-impact ionization, was observed in the first half of the voltage pulse. Simultaneous, very effective electron-impact ionization of sputtered Zr atoms was proved. A composition of particle fluxes onto the substrate during a film deposition was found almost independent of the instantaneous oscillating oxygen partial pressure.
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7 May 2017
Research Article|
March 07 2017
Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering
Andrea Dagmar Pajdarová
;
Andrea Dagmar Pajdarová
a)
Department of Physics and NTIS – European Centre of Excellence,
University of West Bohemia
, Univerzitní 8, Plzeň 306 14, Czech Republic
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Jaroslav Vlček;
Jaroslav Vlček
Department of Physics and NTIS – European Centre of Excellence,
University of West Bohemia
, Univerzitní 8, Plzeň 306 14, Czech Republic
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Jiří Rezek
Jiří Rezek
Department of Physics and NTIS – European Centre of Excellence,
University of West Bohemia
, Univerzitní 8, Plzeň 306 14, Czech Republic
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a)
Electronic mail: adp@kfy.zcu.cz
J. Appl. Phys. 121, 171908 (2017)
Article history
Received:
November 07 2016
Accepted:
January 10 2017
Citation
Andrea Dagmar Pajdarová, Jaroslav Vlček, Jiří Rezek; Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering. J. Appl. Phys. 7 May 2017; 121 (17): 171908. https://doi.org/10.1063/1.4977822
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