Over the past few years, there has been a growing interest in layered transition metal dichalcogenides such as molybdenum disulfide (MoS2). Most studies so far have focused on the electronic and optoelectronic properties of single-layer MoS2, whose band structure features a direct bandgap, in sharp contrast to the indirect bandgap of thicker MoS2. In this paper, we present a systematic study of the thickness-dependent electrical and thermoelectric properties of few-layer MoS2. We observe that the electrical conductivity () increases as we reduce the thickness of MoS2 and peaks at about two layers, with six-times larger conductivity than our thickest sample (23-layer MoS2). Using a back-gate voltage, we modulate the Fermi energy () of the sample where an increase in the Seebeck coefficient () is observed with decreasing gate voltage () towards the subthreshold (OFF state) of the device, reaching as large as in a four-layer MoS2. While previous reports have focused on a single-layer MoS2 and measured Seebeck coefficient in the OFF state, which has vanishing electrical conductivity and thermoelectric power factor (), we show that MoS2-based devices in their ON state can have as large as in the two-layer sample. The increases with decreasing thickness and then drops abruptly from double-layer to single-layer MoS2, a feature we suggest as due to a change in the energy dependence of the electron mean-free-path according to our theoretical calculation. Moreover, we show that care must be taken in thermoelectric measurements in the OFF state to avoid obtaining erroneously large Seebeck coefficients when the channel resistance is very high. Our study paves the way towards a more comprehensive examination of the thermoelectric performance of two-dimensional (2D) semiconductors.
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7 October 2016
Research Article|
October 04 2016
Gate-tunable and thickness-dependent electronic and thermoelectric transport in few-layer MoS2
Morteza Kayyalha;
Morteza Kayyalha
a)
1Birck Nanotechnology Center,
Purdue University
, West Lafayette, Indiana 47907, USA
2School of Electrical and Computer Engineering,
Purdue University
, West Lafayette, Indiana 47907, USA
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Jesse Maassen;
Jesse Maassen
2School of Electrical and Computer Engineering,
Purdue University
, West Lafayette, Indiana 47907, USA
3Department of Physics and Atmospheric Science,
Dalhousie University
, Halifax, Nova Scotia B3H 4R2, Canada
4Network for Computational Nanotechnology,
Purdue University
, West Lafayette, Indiana 47907, USA
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Mark Lundstrom
;
Mark Lundstrom
2School of Electrical and Computer Engineering,
Purdue University
, West Lafayette, Indiana 47907, USA
4Network for Computational Nanotechnology,
Purdue University
, West Lafayette, Indiana 47907, USA
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Li Shi
;
Li Shi
5Department of Mechanical Engineering,
University of Texas at Austin
, Austin, Texas 78712, USA
6Materials Science and Engineering Program,
University of Texas at Austin
, Austin, Texas 78712, USA
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Yong P. Chen
Yong P. Chen
a)
1Birck Nanotechnology Center,
Purdue University
, West Lafayette, Indiana 47907, USA
2School of Electrical and Computer Engineering,
Purdue University
, West Lafayette, Indiana 47907, USA
7Department of Physics and Astronomy,
Purdue University
, West Lafayette, Indiana 47907, USA
8Purdue Quantum Center,
Purdue University
, West Lafayette, Indiana 47907, USA
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a)
Authors to whom correspondence should be addressed. Electronic addresses: [email protected] and [email protected]
J. Appl. Phys. 120, 134305 (2016)
Article history
Received:
May 20 2015
Accepted:
September 13 2016
Citation
Morteza Kayyalha, Jesse Maassen, Mark Lundstrom, Li Shi, Yong P. Chen; Gate-tunable and thickness-dependent electronic and thermoelectric transport in few-layer MoS2. J. Appl. Phys. 7 October 2016; 120 (13): 134305. https://doi.org/10.1063/1.4963364
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