Very thin aluminum-doped zinc oxide (AZO) films with a well-defined (0001) orientation and a surface roughness of 0.357 nm were deposited on amorphous glass substrates at a temperature of 200 °C by radio frequency magnetron sputtering, which are promising, particularly in terms of orientation evolution, surface roughness, and carrier transport, as buffer layers for the subsequent deposition of highly (0001)-oriented AZO polycrystalline films of 490 nm thickness by direct current (DC) magnetron sputtering. Sintered AZO targets with an Al2O3 content of 2.0 wt. % were used. DC magnetron sputtered AZO films on bare glass substrates showed a mixed (0001) and the others crystallographic orientation, and exhibited a high contribution of grain boundary scattering to carrier transport, resulting in reduced Hall mobility. Optimizing the thickness of the AZO buffer layers to 10 nm led to highly (0001)-oriented bulk AZO films with a marked reduction in the above contribution, resulting in AZO films with improved Hall mobility together with enhanced carrier concentration. The surface morphology and point defect density were also improved by applying the buffer layers, as shown by atomic force microscopy and Raman spectroscopy, respectively.

1.
X. W.
Sun
,
R. F.
Xiao
, and
H. S.
Kwok
,
J. Appl. Phys.
84
,
5776
(
1998
).
2.
R. D.
Vispute
,
V.
Talyansky
,
Z.
Trajanovic
,
S.
Choopun
,
M.
Downes
,
R. P.
Sharma
,
T.
Venkatesan
,
M. C.
Woods
,
R. T.
Lareau
,
K. A.
Jones
, and
A. A.
Iliadis
,
Appl. Phys. Lett.
70
,
2735
(
1997
).
3.
T.
Yamamoto
and
H.
Katayama-Yoshida
,
Jpn. J. Appl. Phys.
38
,
L166
(
1999
).
5.
F.
Paraguay
,
D. M.
Miki-Yoshida
,
J.
Morales
,
J.
Solis
, and
W.
Estrada
,
Thin Solid Films
373
,
137
(
2000
).
6.
J. F.
Chang
,
H. H.
Kuo
,
I. C.
Leu
, and
M. H.
Hon
,
Sens. Actuators B
84
,
258
(
2002
).
7.
N.
Han
,
Y.
Tian
,
X.
Wu
, and
Y.
Chen
,
Sens. Actuators B
138
,
228
(
2009
).
8.
S.
Kishimoto
,
S.
Akamatsu
,
H.
Song
,
J.
Nomoto
,
H.
Makino
, and
T.
Yamamoto
,
J. Sens. Sens. Syst.
3
,
331
(
2014
).
9.
K.
Kushiya
,
S.
Kuriyama
,
I.
Hara
,
Y.
Nagoya
,
M.
Tachiyuki
, and
Y.
Fujiwara
, in
Proceedings of 29th IEEE Photovoltaic Specialists Conference
(
Institute of Electrical and Electronics Engineers
,
New Orleans, LA
,
2002
), p.
579
.
10.
J.
Krc
,
M.
Zeman
,
O.
Kluth
,
F.
Smole
, and
M.
Topic
,
Thin Solid Films
426
,
296
(
2003
).
11.
M.
Berginski
,
J.
Hüpkes
,
M.
Schulte
,
G.
Schöpe
,
H.
Stiebig
,
B.
Rech
, and
M.
Wuttig
,
J. Appl. Phys.
101
,
074903
(
2007
).
12.
J.
Nomoto
,
Y.
Nishi
,
T.
Miyata
, and
T.
Minami
,
Thin Solid Films
534
,
426
(
2013
).
13.
N.
Yamamoto
,
H.
Makino
,
S.
Osone
,
A.
Ujihara
,
T.
Ito
,
H.
Hokari
,
T.
Maruyama
, and
T.
Yamamoto
,
Thin Solid Films
520
,
4131
(
2012
).
14.
P. R.
West
,
S.
Ishii
,
G. V.
Naik
,
N. K.
Emani
,
V. M.
Shalaev
, and
A.
Boltasseva
,
Laser Photonics Rev.
4
,
795
(
2010
).
15.
J.
Kim
,
G. V.
Naik
,
A. V.
Gavrilenko
,
K.
Dondapati
,
V. I.
Gavrilenko
,
S. M.
Prokes
,
O. J.
Glembocki
,
V. M.
Shalaev
, and
A.
Boltasseva
,
Phys. Rev. X
3
,
041037
(
2013
).
16.
A. K.
Pradhan
,
R. M.
Mundle
,
K.
Santiago
,
J. R.
Skuza
,
B.
Xiao
,
K. D.
Song
,
M.
Bahoura
,
R.
Cheaito
, and
P. E.
Hopkins
,
Sci. Rep.
4
,
6415
(
2014
).
17.
N.
Kinsey
,
C.
Devault
,
J.
Kim
,
M.
Ferrera
,
V. M.
Shalaev
, and
A.
Boltasseva
,
Optica
2
,
616
(
2015
).
18.
A.
Miyake
,
T.
Yamada
,
H.
Makino
,
N.
Yamamoto
, and
T.
Yamamoto
,
Thin Solid Films
517
,
1037
(
2008
).
19.
A.
Miyake
,
T.
Yamada
,
H.
Makino
,
N.
Yamamoto
, and
T.
Yamamoto
,
Thin Solid Films
517
,
3130
(
2009
).
20.
K.
Nagamoto
,
K.
Kato
,
S.
Naganawa
,
T.
Kondo
,
Y.
Sato
,
H.
Makino
,
N.
Yamamoto
, and
T.
Yamamoto
,
Thin Solid Films
520
,
1411
(
2011
).
21.
C. H.
Tseng
,
W. H.
Wang
,
H. C.
Chang
,
C. P.
Chou
, and
C. Y.
Hsu
,
Vacuum
85
,
263
(
2010
).
22.
J. H.
Shi
,
S. M.
Huang
,
J. B.
Chu
,
H. B.
Zhu
,
Z. A.
Wang
,
X. D.
Li
,
D. W.
Zhang
,
Z.
Sun
,
W. J.
Cheng
,
F. Q.
Huang
, and
X. J.
Yin
,
J. Mater. Sci. Mater. Electron.
21
,
1005
(
2010
).
23.
T.
Moon
,
W.
Yoon
,
K. S.
Ji
,
S.-W.
Ahn
,
S.
Lee
,
M.
Joo
,
H. Y.
Shin
,
K.
Park
, and
H.-M.
Lee
,
Appl. Phys. Express
3
,
095801
(
2010
).
24.
J.
Nomoto
,
J.
Oda
,
T.
Miyata
, and
T.
Minami
,
Thin Solid Films
519
,
1587
(
2010
).
25.
N.
Itagaki
,
K.
Kuwahara
,
K.
Nakahara
,
D.
Yamashita
,
G.
Uchida
,
K.
Koda
, and
M.
Shiratani
,
Appl. Phys. Express
4
,
011101
(
2011
).
26.
W.
Dewald
,
V.
Sittinger
,
B.
Szyszka
,
F.
Säuberlich
,
B.
Stannowski
,
D.
Köhl
,
P.
Ries
, and
M.
Wuttig
,
Thin Solid Films
534
,
474
(
2013
).
27.
M.
Kusayanagi
,
A.
Uchida
,
N.
Oka
,
J.
Jia
,
S.
Nakamura
, and
Y.
Shigesato
,
Thin Solid Films
555
,
93
(
2014
).
28.
N.
Sommer
,
M.
Stanley
,
F.
Köhler
,
J.
Mock
, and
J.
Hüpkes
,
J. Appl. Phys.
118
,
035301
(
2015
).
29.
J.
Nomoto
,
H.
Makino
, and
T.
Yamamoto
,
J. Appl. Phys.
117
,
045304
(
2015
).
30.
N.
Fujimura
,
T.
Nishihara
,
S.
Goto
,
J.
Xu
, and
T.
Ito
,
J. Cryst. Growth
130
,
269
(
1993
).
31.
T. M.
Khan
,
M.
Zakria
,
R. I.
Shakoor
,
M.
Raffi
, and
M.
Ahmad
,
Adv. Mater. Lett.
6
,
592
(
2015
).
33.
R.
Bisaro
,
J.
Magariño
,
N.
Proust
, and
K.
Zellama
,
J. Appl. Phys.
59
,
1167
(
1986
).
34.
Y.
Kajikawa
,
J. Cryst. Growth
289
,
387
(
2006
).
35.
J.-I.
Hong
,
J.
Bae
,
Z. L.
Wang
, and
R. L.
Snyder
,
Nanotechnology
20
,
085609
(
2009
).
36.
K. S.
Park
and
J. K.
Park
,
Acta Mater.
47
,
2177
(
1999
).
37.
H.
Amano
,
N.
Sawaki
,
I.
Akasaki
, and
Y.
Toyoda
,
Appl. Phys. Lett.
48
,
353
(
1986
).
38.
S.
Nakamura
,
Jpn. J. Appl. Phys.
30
,
L1705
(
1991
).
39.
M.
Birkholz
,
B.
Selle
,
F.
Fenske
, and
W.
Fuhs
,
Phys. Rev. B
68
,
205414
(
2003
).
40.
M.
Birkholz
, “
Texture and preferred orientation
,” in
Thin Film Analysis by X-Ray Scattering
, edited by
M.
Birkholz
,
P. F.
Fewster
, and
C.
Genzel
(
Wiley-VCH Verlag GmbH & Co. KGaA
,
Weinheim
,
2006
), pp.
191
203
.
41.
D.
Ariosa
,
F.
Elhordoy
,
E. A.
Dalchiele
,
R. E.
Marotti
, and
C.
Stari
,
J. Appl. Phys.
110
,
124901
(
2011
).
42.
M.
Peres
,
S.
Magalhães
,
M. R.
Soares
,
M. J.
Soares
,
L.
Rino
,
E.
Alves
,
K.
Lorenz
,
M. R.
Correia
,
A. C.
Lourenço
, and
T.
Monteiro
,
Phys. Status Solidi C
10
,
662
(
2013
).
43.
K.
Inaba
,
S.
Kobayashi
,
K.
Uehara
,
A.
Okada
,
S. L.
Reddy
, and
T.
Endo
,
Adv. Mater. Phys. Chem.
3
,
72
(
2013
).
44.
K.
Nagao
and
E.
Kagami
,
Rigaku Janaru
27
(
2
),
6
(
2011
), available at http://www.rigaku.com/en/downloads/rigaku-journal?page=1.
45.
M.
Osada
,
T.
Sakemi
, and
T.
Yamamoto
,
Thin Solid Films
494
,
38
(
2006
).
46.
J.
Nomoto
,
H.
Makino
, and
T.
Yamamoto
,
Nanoscale Res. Lett.
11
,
320
(
2016
).
48.
U. S.
Mbamara
,
B.
Olofinjana
,
C.
Lorenzo-Martin
,
O. O.
Ajayi
,
E. I.
Obiajunwa
, and
E. O. B.
Ajayi
,
J. Nanosci. Nanoeng.
1
,
18
(
2015
), available at http://files.aiscience.org/journal/article/html/70270005.html.
49.
V.
Russo
,
M.
Ghidelli
,
P.
Gondoni
,
C. S.
Casari
, and
A.
Li Bassi
,
J. Appl. Phys.
115
,
073508
(
2014
).
50.
I.
Volintiru
,
M.
Creatore
, and
M. C. M.
van de Sanden
,
J. Appl. Phys.
103
,
033704
(
2008
).
51.
T.
Yamada
,
H.
Makino
,
N.
Yamamoto
, and
T.
Yamamoto
,
J. Appl. Phys.
107
,
123534
(
2010
).
52.
T.
Yamamoto
,
H.
Song
, and
H.
Makino
,
Phys. Status Solidi C
10
,
603
(
2013
).
53.
H.
Fujiwara
and
M.
Kondo
,
Phys. Rev. B
71
,
075109
(
2005
).
54.
J.
Steinhauser
,
S.
Faÿ
,
N.
Oliveira
,
E.
Vallat-Sauvain
, and
C.
Ballif
,
Appl. Phys. Lett.
90
,
142107
(
2007
).
55.
H.
Makino
,
N.
Yamamoto
,
A.
Miyake
,
T.
Yamada
,
Y.
Hirashima
,
H.
Iwaoka
,
T.
Itoh
,
H.
Hokari
,
H.
Aoki
, and
T.
Yamamoto
,
Thin Solid Films
518
,
1386
(
2009
).
56.
R.
Cebulla
,
R.
Wendt
, and
K.
Ellmer
,
J. Appl. Phys.
83
,
1087
(
1998
).
57.
G. Y.
Yeom
,
J. A.
Thornton
, and
M. J.
Kushner
,
J. Appl. Phys.
65
,
3816
(
1989
).
58.
W. O.
Hofer
,
Scanning Microsc. Suppl.
4
,
265
(
1990
).
59.
S.
Ishibashi
,
Y.
Higuchi
,
Y.
Ota
, and
K.
Nakamura
,
J. Vac. Sci. Technol. A
8
,
1403
(
1990
).
60.
G. K.
Williamson
and
W. H.
Hall
,
Acta Metall.
1
,
22
(
1953
).
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