We present a versatile nanomechanical sensing platform for the investigation of magnetostriction in thin films. It is based on a doubly clamped silicon nitride nanobeam resonator covered with a thin magnetostrictive film. Changing the magnetization direction within the film plane by an applied magnetic field generates a magnetoelastic stress and thus changes the resonance frequency of the nanobeam. A measurement of the resulting resonance frequency shift, e.g., by optical interferometry, allows to quantitatively determine the magnetostriction constants of the thin film. In a proof-of-principle experiment, we determine the magnetostriction constants of a 10 nm thick polycrystalline cobalt film, showing very good agreement with literature values. The presented technique aims, in particular, for the precise measurement of magnetostriction in a variety of (conducting and insulating) thin films, which can be deposited by, e.g., electron beam deposition, thermal evaporation, or sputtering.
A versatile platform for magnetostriction measurements in thin films
M. Pernpeintner, R. B. Holländer, M. J. Seitner, E. M. Weig, R. Gross, S. T. B. Goennenwein, H. Huebl; A versatile platform for magnetostriction measurements in thin films. J. Appl. Phys. 7 March 2016; 119 (9): 093901. https://doi.org/10.1063/1.4942531
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