We report on van der Waals epitaxial growth, materials characterization, and magnetotransport experiments in crystalline nanosheets of Bismuth Telluro-Sulfide (BTS). Highly layered, good-quality crystalline nanosheets of BTS are obtained on SiO2 and muscovite mica. Weak-antilocalization (WAL), electron-electron interaction-driven insulating ground state and universal conductance fluctuations are observed in magnetotransport experiments on BTS devices. Temperature, thickness, and magnetic field dependence of the transport data indicate the presence of two-dimensional surface states along with bulk conduction, in agreement with theoretical models. An extended-WAL model is proposed and utilized in conjunction with a two-channel conduction model to analyze the data, revealing a surface component and evidence of multiple conducting channels. A facile growth method and detailed magnetotransport results indicating BTS as an alternative topological insulator material system are presented.
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7 February 2016
Research Article|
February 03 2016
Weak antilocalization and universal conductance fluctuations in bismuth telluro-sulfide topological insulators
Tanuj Trivedi
;
Tanuj Trivedi
a)
Microelectronics Research Center,
The University of Texas at Austin
, Austin, Texas 78758, USA
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Sushant Sonde;
Sushant Sonde
Microelectronics Research Center,
The University of Texas at Austin
, Austin, Texas 78758, USA
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Hema C. P. Movva;
Hema C. P. Movva
Microelectronics Research Center,
The University of Texas at Austin
, Austin, Texas 78758, USA
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Sanjay K. Banerjee
Sanjay K. Banerjee
b)
Microelectronics Research Center,
The University of Texas at Austin
, Austin, Texas 78758, USA
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a)
Electronic mail: tanuj@utexas.edu
b)
Electronic mail: banerjee@ece.utexas.edu
J. Appl. Phys. 119, 055706 (2016)
Article history
Received:
December 09 2015
Accepted:
January 20 2016
Citation
Tanuj Trivedi, Sushant Sonde, Hema C. P. Movva, Sanjay K. Banerjee; Weak antilocalization and universal conductance fluctuations in bismuth telluro-sulfide topological insulators. J. Appl. Phys. 7 February 2016; 119 (5): 055706. https://doi.org/10.1063/1.4941265
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