Detailed polarization switching behavior of an Al2O3/Pb(Zr,Ti)O3 (AO/PZT) structure is examined by comparing the phenomenological thermodynamic model to the experimental polarization–voltage (P-V) results. Amorphous AO films with various thicknesses (2–10 nm) were deposited on the polycrystalline 150-nm-thick PZT film. The thermodynamic calculation showed that the transition from the ferroelectric-like state to the paraelectric-like state with increasing AO thickness occurs at ∼3 nm thickness. This paraelectric-like state should have exhibited a negative capacitance effect without permanent polarization switching if no other adverse effects are involved. However, experiments showed typical ferroelectric-like hysteresis loops where the coercive voltage increased with the increasing AO thickness, which could be explained by the carrier injection through the thin AO layer and trapping of the carriers at the AO/PZT interface. The fitting of the experimental P-V loops using the thermodynamic model considering the depolarization energy effect showed that trapped charge density was ∼±0.1 Cm−2 and critical electric field at the Pt electrode/AO interface, at which the carrier transport occurs, was ∼±10 MV/cm irrespective of the AO thickness. Energy band model at each electrostatic state along the P-V loop was provided to elucidate correlation between macroscopic polarization and internal charge state of the stacked films.
Skip Nav Destination
,
,
,
,
,
,
,
,
Article navigation
14 December 2015
Research Article|
December 14 2015
Interfacial charge-induced polarization switching in Al2O3/Pb(Zr,Ti)O3 bi-layer
Yu Jin Kim;
Yu Jin Kim
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Min Hyuk Park;
Min Hyuk Park
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Woojin Jeon;
Woojin Jeon
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Han Joon Kim;
Han Joon Kim
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Taehwan Moon;
Taehwan Moon
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Young Hwan Lee;
Young Hwan Lee
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Keum Do Kim;
Keum Do Kim
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Seung Dam Hyun;
Seung Dam Hyun
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Cheol Seong Hwang
Cheol Seong Hwang
a)
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
Search for other works by this author on:
Yu Jin Kim
Min Hyuk Park
Woojin Jeon
Han Joon Kim
Taehwan Moon
Young Hwan Lee
Keum Do Kim
Seung Dam Hyun
Cheol Seong Hwang
a)
Department of Materials Science & Engineering and Inter-University Semiconductor Research Center, College of Engineering,
Seoul National University
, Seoul 151-744, South Korea
a)
Author to whom correspondence should be addressed. Electronic mail: [email protected]
J. Appl. Phys. 118, 224105 (2015)
Article history
Received:
October 28 2015
Accepted:
November 27 2015
Citation
Yu Jin Kim, Min Hyuk Park, Woojin Jeon, Han Joon Kim, Taehwan Moon, Young Hwan Lee, Keum Do Kim, Seung Dam Hyun, Cheol Seong Hwang; Interfacial charge-induced polarization switching in Al2O3/Pb(Zr,Ti)O3 bi-layer. J. Appl. Phys. 14 December 2015; 118 (22): 224105. https://doi.org/10.1063/1.4937544
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
Piezoelectric thin films and their applications in MEMS: A review
Jinpeng Liu, Hua Tan, et al.
Tutorial: Simulating modern magnetic material systems in mumax3
Jonas J. Joos, Pedram Bassirian, et al.
Related Content
Improved ferroelectric property of very thin Mn-doped BiFeO3 films by an inlaid Al2O3 tunnel switch
J. Appl. Phys. (October 2011)
Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer
Appl. Phys. Lett. (November 2014)
Comparison of the degradation characteristics of AlON/InGaAs and Al2O3/InGaAs stacks
J. Appl. Phys. (March 2015)
Space-charge-controlled field emission model of current conduction through Al2O3 films
J. Appl. Phys. (February 2016)