Thin films of monoclinic nanostructured vanadium dioxide are notoriously difficult to produce in a selective manner. To date, post-annealing, after pulsed laser deposition (PLD), has been used to revert the crystal phase or to remove impurities, and non-glass substrates have been employed, thus reducing the efficacy of the transparency switching. Here, we overcome these limitations in PLD by optimizing a laser-ablation and deposition process through optical imaging of the laser-induced plasma. We report high quality monoclinic rutile-type vanadium dioxide (VO2) (M1) nanoparticles without post-annealing, and on a glass substrate. Our samples demonstrate a reversible metal-to-insulator transition at ∼43 °C, without any doping, paving the way to switchable transparency in optical materials at room temperature.
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28 October 2015
Research Article|
October 27 2015
Phase-selective vanadium dioxide (VO2) nanostructured thin films by pulsed laser deposition
B. N. Masina;
B. N. Masina
a)
1
CSIR-National Laser Centre
, PO BOX 395, Pretoria 0001, South Africa
2School of Physics,
University of KwaZulu-Natal
, Private Bag X54001, Durban 4000, South Africa
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S. Lafane;
S. Lafane
a)
3Division des Milieux Ionisés et Laser,
Centre de Développement des Technologies Avancées
, Cité du 20 Août 1956, BP 17, Baba Hassen, Algeria
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L. Wu
;
L. Wu
1
CSIR-National Laser Centre
, PO BOX 395, Pretoria 0001, South Africa
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A. A. Akande;
A. A. Akande
4
DST/CSIR National Centre for Nano-Structured Materials
, PO BOX 395, Pretoria 0001, South Africa
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B. Mwakikunga;
B. Mwakikunga
4
DST/CSIR National Centre for Nano-Structured Materials
, PO BOX 395, Pretoria 0001, South Africa
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S. Abdelli-Messaci;
S. Abdelli-Messaci
3Division des Milieux Ionisés et Laser,
Centre de Développement des Technologies Avancées
, Cité du 20 Août 1956, BP 17, Baba Hassen, Algeria
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T. Kerdja;
T. Kerdja
3Division des Milieux Ionisés et Laser,
Centre de Développement des Technologies Avancées
, Cité du 20 Août 1956, BP 17, Baba Hassen, Algeria
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A. Forbes
A. Forbes
5School of Physics,
University of the Witwatersrand
, Private Bag 3, Wits 2050, Johannesburg, South Africa
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a)
Authors to whom correspondence should be addressed. Electronic addresses: [email protected] and [email protected]
J. Appl. Phys. 118, 165308 (2015)
Article history
Received:
August 05 2015
Accepted:
October 13 2015
Citation
B. N. Masina, S. Lafane, L. Wu, A. A. Akande, B. Mwakikunga, S. Abdelli-Messaci, T. Kerdja, A. Forbes; Phase-selective vanadium dioxide (VO2) nanostructured thin films by pulsed laser deposition. J. Appl. Phys. 28 October 2015; 118 (16): 165308. https://doi.org/10.1063/1.4934641
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