We describe a new type of optically sensitive tunable capacitor with a wide band response ranging from the ultraviolet (245 nm) to the near infrared (880 nm). It is based on a planar Metal-Oxide-Semiconductor (MOS) structure fabricated on an insulator on silicon substrate where the insulator layer comprises a double layer dielectric stack of SiO2-HfO2. Two operating configurations have been examined, a single diode and a pair of back-to-back connected devices, where either one or both diodes are illuminated. The varactors exhibit, in all cases, very large sensitivities to illumination. Near zero bias, the capacitance dependence on illumination intensity is sub linear and otherwise it is nearly linear. In the back-to-back connected configuration, the reverse biased diode acts as a light tunable resistor whose value affects strongly the capacitance of the second, forward biased, diode and vice versa. The proposed device is superior to other optical varactors in its large sensitivity to illumination in a very broad wavelength range (245 nm–880 nm), the strong capacitance dependence on voltage and the superior current photo responsivity. Above and beyond that structure requires a very simple fabrication process which is CMOS compatible.

1.
I.
Gutierrez
,
J.
Meléndez
, and
E.
Hernández
,
Design and Characterization of Integrated Varactors for RF Applications
(
West Sussex
,
England: J. Wiley
,
2006
).
2.
M. P. J.
Tiggelman
,
K.
Reimann
,
F.
Van Rijs
,
J.
Schmitz
, and
R. J.
Hueiting
,
IEEE Trans. Electron Devices
56
,
2128
(
2009
).
3.
P.
Dianat
,
R.
Prusak
,
A.
Persano
,
A.
Cola
,
F.
Quaranta
, and
B.
Nabet
,
IEEE Trans. Electron Devices
61
,
445
(
2014
).
4.
X.
Zhao
,
A.
Cola
,
A.
Tersigni
,
F.
Quaranta
,
E.
Gallo
,
J. E.
Spanier
, and
B.
Nabet
,
IEEE Electron Device Lett.
27
,
710
(
2006
).
5.
P.
Dianat
,
R. W.
Prusak
,
E.
Gallo
,
A.
Cola
,
A.
Persano
,
F.
Quaranta
, and
B.
Nabet
,
Appl. Phys. Lett.
100
,
153505
(
2012
).
6.
P.
Dianat
,
A.
Persano
,
F.
Quaranta
,
A.
Cola
, and
B.
Nabet
,
IEEE J. Sel. Top. Quantum Electron.
21
,
3800605
(
2015
).
7.
D.
Lopez
,
F.
Monsieur
, and
F.
Balestra
, in
Proceedings of the 26th International Conference on Microelectronics, NIS, Serbia
(
2008
), p.
11
.
8.
T.
Saxena
,
S. L.
Rumyantsev
,
P. S.
Dutta
, and
M.
Shur
,
Semicond. Sci. Technol.
29
,
025002
(
2014
).
9.
D.
Ciplys
,
V. S.
Chivukula
,
A.
Sereika
,
R.
Rimeika
,
M. S.
Shur
,
X.
Hu
, and
R.
Gaska
,
Electron. Lett.
45
,
653
(
2009
).
10.
V. S.
Chivukula
,
D.
Ciplys
,
A.
Sereika
,
M. S.
Shur
,
J.
Yang
, and
R.
Gaska
,
Appl. Phys. Lett.
96
,
163504
(
2010
).
11.
J.
Chu
,
Z.
Han
,
F.
Meng
, and
Z.
Wang
,
Solid-State Electron.
55
,
54
(
2011
).
12.
E.
Monroy
,
F.
Omnes
, and
F.
Calle
,
Semicond. Sci. Technol.
18
,
R33
(
2003
).
13.
O.
Bulteel
,
N. V.
Overstraeten-Schlogel
,
A.
Afzalian
,
P.
Dupuis
,
S.
Jeumont
,
L.
Irenge
,
J.
Ambroise
,
B.
Macq
,
J.-L.
Gala
, and
D.
Flandre
, in
Biomedical Engineering, Trends in Electronics, Communications and Software
, edited by
A. N.
Laskovski
(
InTech
,
2011
), Chap. 14, p.
257
.
14.
V.
Mikhelashvili
,
D.
Cristea
,
B.
Meyler
,
S.
Yofis
,
Y.
Shneider
,
G.
Atiya
,
T.
Cohen-Hyams
,
Y.
Kauffmann
,
W. D.
Kaplan
, and
G.
Eisenstein
,
J. Appl. Phys.
116
,
074513
(
2014
).
15.
J. J.
Yang
,
M. D.
Pickett
,
X.
Li
,
D. A. A.
Ohlberg
,
D. R.
Stewart
, and
R. S.
Williams
,
Nat. Nanotechnol.
3
,
429
(
2008
).
16.
E. A.
Choi
and
K. J.
Chang
,
Appl. Phys. Lett.
94
,
122901
(
2009
).
17.
K. L.
Lin
,
T. H.
Hou
,
J.
Shieh
,
J. H.
Lin
,
C. T.
Chou
, and
Y. J.
Lee
,
J. Appl. Phys.
109
,
084104
(
2011
).
18.
R. M.
Fleming
,
D. V.
Lang
,
C. D. W.
Jones
,
M. L.
Steigerwald
,
D. W.
Murphy
,
G. B.
Alers
,
Y.-H.
Wong
,
R. B.
van Dover
,
J. R.
Kwo
, and
A. M.
Sergent
,
J. Appl. Phys.
88
,
850
(
2000
).
19.
E. H.
Nicollian
and
J. R.
Brews
,
MOS Physics and Technology
(
Wiley
,
New York
,
1982
).
20.
H. P.
Chen
,
Y.
Yuan
,
B.
Yu
,
J.
Ahn
,
P. C.
McIntyre
,
P. M.
Asbeck
,
M. J. W.
Rodwell
, and
Y.
Taur
,
IEEE Trans. Electron Devices
59
,
2383
(
2012
).
21.
H. P.
Chen
,
D.
Veksler
,
G.
Bersuker
, and
Y.
Taur
,
IEEE Trans. Electron Devices
61
,
1483
(
2014
).
22.
F.
Palumbo
,
P.
Shekhter
, and
M.
Eizenberg
,
Solid-State Electron.
93
,
56
(
2014
).
23.
R.
Engel-Herbert
,
Y.
Hwang
, and
S.
Stemmer
,
J. Appl. Phys.
108
,
124101
(
2010
).
24.
M. A.
Green
and
J.
Shewhun
,
Solid-Slate Electron.
16
,
1141
(
1973
).
25.
P. S.
Ho
,
E. S.
Yang
,
H. L.
Evans
, and
X.
Wu
,
Phys. Rev. Lett.
56
,
177
(
1986
).
26.
J.
Werner
,
A. F.
Levi
,
R. T.
Tung
,
M.
Anzlowar
, and
M.
Pinto
,
Phys. Rev. Lett.
60
,
53
(
1988
).
27.
P.
Chattopadhyay
and
B.
RayChaudhuri
,
Solid-State Electron.
35
,
875
(
1992
).
28.
D. L.
Scharfetter
,
Solid-State Electron.
8
,
299
(
1965
).
29.
P.
Chattopadhyay
and
B.
RayChaudhuri
,
Solid-State Electron.
36
,
605
(
1993
).
You do not currently have access to this content.