We produce and characterize high-angle femtosecond Bessel beams at 1300-nm wavelength leading to nonlinearly ionized plasma micro-channels in both glass and silicon. With microjoule pulse energy, we demonstrate controlled through-modifications in 150-μm glass substrates. In silicon, strong two-photon absorption leads to larger damages at the front surface but also a clamping of the intensity inside the bulk at a level of ≈4 × 1011 W cm−2 which is below the threshold for volume and rear surface modification. We show that the intensity clamping is associated with a strong degradation of the Bessel-like profile. The observations highlight that the inherent limitation to ultrafast energy deposition inside semiconductors with Gaussian focusing [Mouskeftaras et al., Appl. Phys. Lett. 105, 191103 (2014)] applies also for high-angle Bessel beams.
References
1.
R. R.
Gattass
and E.
Mazur
, “Femtosecond laser micromachining in transparent materials
,” Nat. Photonics
2
, 219
–225
(2008
).2.
A. H.
Nejadmalayeri
, P. R.
Herman
, J.
Burghoff
, M.
Will
, S.
Nolte
, and A.
Tünnermann
, “Inscription of optical waveguides in crystalline silicon by mid-infrared femtosecond laser pulses
,” Opt. Lett.
30
, 964
(2005
).3.
V. V.
Kononenko
, V. V.
Konov
, and E. M.
Dianov
, “Delocalization of femtosecond radiation in silicon
,” Opt. Lett.
37
, 3369
–3371
(2012
).4.
S.
Leyder
, D.
Grojo
, P.
Delaporte
, W.
Marine
, M.
Sentis
, and O.
Utéza
, “Multiphoton absorption of 1.3 μm wavelength femtosecond laser pulses focused inside Si and SiO2
,” Proc. SPIE
8770
, 877004
(2013
).5.
A.
Mouskeftaras
, A. V.
Rode
, R.
Clady
, M.
Sentis
, O.
Utéza
, and D.
Grojo
, “Self-limited underdense microplasmas in bulk silicon induced by ultrashort laser pulses
,” Appl. Phys. Lett.
105
, 191103
(2014
).6.
A. D.
Bristow
, N.
Rotenberg
, and H. M.
van Driel
, “Two-photon absorption and Kerr coefficients of silicon for 8502200 nm
,” Appl. Phys. Lett.
90
, 191104
(2007
).7.
D.
Grojo
, S.
Leyder
, P.
Delaporte
, W.
Marine
, M.
Sentis
, and O.
Utéza
, “Long-wavelength multiphoton ionization inside band-gap solids
,” Phys. Rev. B
88
, 195135
(2013
).8.
A.
Couairon
and A.
Mysyrowicz
, “Femtosecond filamentation in transparent media
,” Phys. Rep.
441
, 47
–189
(2007
).9.
D.
Faccio
, E.
Rubino
, A.
Lotti
, A.
Couairon
, A.
Dubietis
, G.
Tamošauskas
, D. G.
Papazoglou
, and S.
Tzortzakis
, “Nonlinear light-matter interaction with femtosecond high-angle Bessel beams
,” Phys. Rev. A
85
, 033829
(2012
).10.
M. K.
Bhuyan
, F.
Courvoisier
, P. A.
Lacourt
, M.
Jacquot
, R.
Salut
, L.
Furfaro
, and J. M.
Dudley
, “High aspect ratio nanochannel machining using single shot femtosecond Bessel beams
,” Appl. Phys. Lett.
97
, 081102
(2010
).11.
P. C.
Verburg
, G. R. B. E.
Römer
, and A. J.
Huis in t Veld
, “Two-photoninduced internal modification of silicon by erbium-doped fiber laser
,” Opt. Express
22
, 21958
(2014
).12.
O.
Tokel
, A.
Turnali
, I.
Pavlov
, S.
Tozburun
, I.
Akca
, and F.
Ilday
, “Laser-writing in silicon for 3D information processing
,” e-print arXiv:1409.2827v1.13.
M.
Mori
, Y.
Shimotsuma
, T.
Sei
, M.
Sakakura
, K.
Miura
, and H.
Udono
, “Tailoring thermoelectric properties of nanostructured crystal silicon fabricated by infrared femtosecond laser direct writing
,” Phys. Status Solidi A
212
, 715
–721
(2015
).14.
R. M.
Herman
and T. A.
Wiggins
, “Production and uses of diffractionless beams
,” J. Opt. Soc. Am. A
8
, 932
(1991
).15.
Z.
Bomzon
, M.
Gu
, and J.
Shamir
, “Angular momentum and geometrical phases in tight-focused circularly polarized plane waves
,” Appl. Phys. Lett.
89
, 241104
(2006
).16.
S.
Leyder
, D.
Grojo
, P.
Delaporte
, W.
Marine
, M.
Sentis
, and O.
Utéza
, “Non-linear absorption of focused femtosecond laser pulses at 1.3 μm inside silicon: Independence on doping concentration
,” Appl. Surf. Sci.
278
, 13
–18
(2013
).17.
J. M.
Liu
, “Simple technique for measurements of pulsed Gaussian-beam spot sizes
,” Opt. Lett.
7
, 196
(1982
).18.
C.
Hnatovsky
, V.
Shvedov
, W.
Krolikowski
, and A.
Rode
, “Revealing local field structure of focused ultrashort pulses
,” Phys. Rev. Lett.
106
, 123901
(2011
).19.
D.
Grojo
, M.
Gertsvolf
, H.
Jean-Ruel
, S.
Lei
, L.
Ramunno
, D. M.
Rayner
, and P. B.
Corkum
, “Self-controlled formation of microlenses by optical breakdown inside wide-band-gap materials
,” Appl. Phys. Lett.
93
, 243118
(2008
).20.
A.
Joglekar
, H.
Liu
, G.
Spooner
, E.
Meyhfer
, G.
Mourou
, and A.
Hunt
, “A study of the deterministic character of optical damage by femtosecond laser pulses and applications to nanomachining
,” Appl. Phys. B: Lasers Opt.
77
, 25
–30
(2003
).21.
C.
Hnatovsky
, E.
Simova
, P. P.
Rajeev
, D. M.
Rayner
, P. B.
Corkum
, and R. S.
Taylor
, “Femtosecond laser writing of porous capillaries inside fused silica glass
,” Opt. Lett.
32
, 1459
–1461
(2007
).22.
E. G.
Gamaly
, B.
Luther-Davies
, L.
Hallo
, P.
Nicolai
, and V. T.
Tikhonchuk
, “Laser-matter interaction in the bulk of a transparent solid: Confined microexplosion and void formation
,” Phys. Rev. B
73
, 214101
(2006
).23.
Q.
Lin
, J.
Zhang
, G.
Piredda
, R. W.
Boyd
, P. M.
Fauchet
, and G. P.
Agrawal
, “Dispersion of silicon nonlinearities in the near infrared region
,” Appl. Phys. Lett.
91
, 021111
(2007
).24.
A.
Dragomir
, J. G.
Mcinerney
, and D. N.
Nikogosyan
, “Femtosecond measurements of two-photon absorption coefficients at 264 nm in glasses, crystals, and liquids
,” Appl. Opt.
41
, 4365
–4376
(2002
).25.
A.
Dragomir
, J. G.
McInerney
, D. N.
Nikogosyan
, and P. G.
Kazansky
, “Two-photon absorption properties of commercial fused silica and germanosilicate glass at 264 nm
,” Appl. Phys. Lett.
80
, 1114
(2002
).26.
J.
Amako
, D.
Sawaki
, and E.
Fujii
, “Microstructuring transparent materials by use of nondiffracting ultrashort pulse beams generated by diffractive optics
,” J. Opt. Soc. Am. B
20
, 2562
(2003
).27.
M. K.
Bhuyan
, P. K.
Velpula
, J. P.
Colombier
, T.
Olivier
, N.
Faure
, and R.
Stoian
, “Single-shot high aspect ratio bulk nanostructuring of fused silica using chirp-controlled ultrafast laser Bessel beams
,” Appl. Phys. Lett.
104
, 021107
(2014
).28.
Y.
Matsuoka
, Y.
Kizuka
, and T.
Inoue
, “The characteristics of laser micro drilling using a Bessel beam
,” Appl. Phys. A
84
, 423
–430
(2006
).29.
W.-J.
Tsai
, C.-J.
Gu
, C.-W.
Cheng
, and J.-B.
Horng
, “Internal modification for cutting transparent glass using femtosecond Bessel beams
,” Opt. Eng.
53
, 051503
(2013
).30.
M.
Duocastella
and C.
Arnold
, “Bessel and annular beams for materials processing
,” Laser Photonics Rev.
6
, 607
–621
(2012
).31.
I.
Bogatyrev
, D.
Grojo
, P.
Delaporte
, S.
Leyder
, M.
Sentis
, W.
Marine
, and T.
Itina
, “Non-linear absorption of 1.3-μm wavelength femtosecond laser pulses focused inside semiconductors: Finite difference time domain-two temperature model combined computational study
,” J. Appl. Phys.
110
, 103106
(2011
).32.
J.
Bonse
, S.
Baudach
, J.
Krüger
, W.
Kautek
, and M.
Lenzner
, “Femtosecond laser ablation of siliconmodification thresholds and morphology
,” Appl. Phys. A
74
, 19
–25
(2002
).33.
M.
Dinu
, F.
Quochi
, and H.
Garcia
, “Third-order nonlinearities in silicon at telecom wavelengths
,” Appl. Phys. Lett.
82
, 2954
(2003
).34.
35.
Y.
Ito
, H.
Sakashita
, R.
Suzuki
, M.
Uewada
, K.
Luong
, and R.
Tanabe
, “Modification and machining on back surface of a silicon substrate by femtosecond laser pulses at 1552 nm
,” J. Laser Micro/Nanoeng.
9
, 98
–102
(2014
).36.
B.
Wu
, A.
Kumar
, and S.
Pamarthy
, “High aspect ratio silicon etch: A review
,” J. Appl. Phys.
108
, 051101
(2010
).© 2015 AIP Publishing LLC.
2015
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