It is shown that charge transfer, the process analogous to formation of semiconductor p-n junction, contributes significantly to adsorption energy at semiconductor surfaces. For the processes without the charge transfer, such as molecular adsorption of closed shell systems, the adsorption energy is determined by the bonding only. In the case involving charge transfer, such as open shell systems like metal atoms or the dissociating molecules, the energy attains different value for the Fermi level differently pinned. The Density Functional Theory (DFT) simulation of species adsorption at different surfaces, such as SiC(0001) or GaN(0001) confirms these predictions: the molecular adsorption is independent on the coverage, while the dissociative process adsorption energy varies by several electronvolts.
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28 January 2014
Research Article|
January 31 2014
Fermi level pinning and the charge transfer contribution to the energy of adsorption at semiconducting surfaces
Stanisław Krukowski;
Stanisław Krukowski
a)
1
Institute of High Pressure Physics, Polish Academy of Sciences
, Sokołowska 29/37, 01-142 Warsaw, Poland
2
Interdisciplinary Centre for Modelling, University of Warsaw
, Pawińskiego 5a, 02-106 Warsaw, Poland
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Paweł Kempisty;
Paweł Kempisty
1
Institute of High Pressure Physics, Polish Academy of Sciences
, Sokołowska 29/37, 01-142 Warsaw, Poland
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Paweł Strak;
Paweł Strak
1
Institute of High Pressure Physics, Polish Academy of Sciences
, Sokołowska 29/37, 01-142 Warsaw, Poland
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Konrad Sakowski
Konrad Sakowski
1
Institute of High Pressure Physics, Polish Academy of Sciences
, Sokołowska 29/37, 01-142 Warsaw, Poland
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a)
Author to whom correspondence should be addressed. Electronic mail: [email protected]
J. Appl. Phys. 115, 043529 (2014)
Article history
Received:
December 30 2013
Accepted:
January 13 2014
Citation
Stanisław Krukowski, Paweł Kempisty, Paweł Strak, Konrad Sakowski; Fermi level pinning and the charge transfer contribution to the energy of adsorption at semiconducting surfaces. J. Appl. Phys. 28 January 2014; 115 (4): 043529. https://doi.org/10.1063/1.4863338
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