In this work, we present the pulsing frequency induced change in the structural, optical, vibrational, and luminescence properties of tungsten oxide (WO3) thin films deposited on microscopic glass and fluorine doped tin oxide (SnO2:F) coated glass substrates by pulsed dc magnetron sputtering technique. The WO3 films deposited on SnO2:F substrate belongs to monoclinic phase. The pulsing frequency has a significant influence on the preferred orientation and crystallinity of WO3 film. The maximum optical transmittance of 85% was observed for the film and the slight shift in transmission threshold towards higher wavelength region with increasing pulsing frequency revealed the systematic reduction in optical energy band gap (3.78 to 3.13 eV) of the films. The refractive index (n) of films are found to decrease (1.832 to 1.333 at 550 nm) with increasing pulsing frequency and the average value of extinction coefficient (k) is in the order of 10−3. It was observed that the dispersion data obeyed the single oscillator of the Wemple-Didomenico model, from which the dispersion energy (Ed) parameters, dielectric constants, plasma frequency, oscillator strength, and oscillator energy (Eo) of WO3 films were calculated and reported for the first time due to variation in pulsing frequency during deposition by pulsed dc magnetron sputtering. The Eo is change between 6.30 and 3.88 eV, while the Ed varies from 25.81 to 7.88 eV, with pulsing frequency. The Raman peak observed at 1095 cm−1 attributes the presence of W-O symmetric stretching vibration. The slight shift in photoluminescence band is attributed to the difference in excitons transition. We have made an attempt to discuss and correlate these results with the light of possible mechanisms underlying the phenomena.
Skip Nav Destination
Article navigation
21 March 2014
Research Article|
March 21 2014
Pulsing frequency induced change in optical constants and dispersion energy parameters of WO3 films grown by pulsed direct current magnetron sputtering
K. Punitha;
K. Punitha
1
Department of Physics, Alagappa University
, Karaikudi 630 004, India
Search for other works by this author on:
R. Sivakumar;
R. Sivakumar
a)
2
Directorate of Distance Education, Alagappa University
, Karaikudi 630 004, India
Search for other works by this author on:
C. Sanjeeviraja
C. Sanjeeviraja
3
Department of Physics, Alagappa Chettiar College of Engineering and Technology
, Karaikudi 630 004, India
Search for other works by this author on:
a)
Author to whom correspondence should be addressed. Electronic mail: krsivakumar1979@yahoo.com
J. Appl. Phys. 115, 113512 (2014)
Article history
Received:
October 04 2013
Accepted:
March 10 2014
Citation
K. Punitha, R. Sivakumar, C. Sanjeeviraja; Pulsing frequency induced change in optical constants and dispersion energy parameters of WO3 films grown by pulsed direct current magnetron sputtering. J. Appl. Phys. 21 March 2014; 115 (11): 113512. https://doi.org/10.1063/1.4869209
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Pay-Per-View Access
$40.00
Citing articles via
Impulse coupling enhancement of aluminum targets under laser irradiation in a soft polymer confined geometry
C. Le Bras, E. Lescoute, et al.
A step-by-step guide to perform x-ray photoelectron spectroscopy
Grzegorz Greczynski, Lars Hultman
GaN-based power devices: Physics, reliability, and perspectives
Matteo Meneghini, Carlo De Santi, et al.
Related Content
Optical constants and dispersion energy parameters of NiO thin films prepared by radio frequency magnetron sputtering technique
J. Appl. Phys. (September 2013)
Optical properties of hybrid PEDOT-PSS: ZnO thin film
AIP Conference Proceedings (September 2012)
Linear and nonlinear refractive index of As–Se–Ge and Bi doped As–Se–Ge thin films
J. Appl. Phys. (June 2010)
Effect of deposition parameters and semi-empirical relations between non-linear refractive index with linear refractive index and third order susceptibility for a-Ge20Se70-xIn10Bix thin films
J. Appl. Phys. (August 2011)
Effect of varying nitrogen flow rates on the optical properties of amorphous-SiCN thin films
AIP Conference Proceedings (November 2016)