FePt thin films with a thickness of 30 nm were deposited by dc magnetron sputtering at room temperature onto SiO2(100 nm)/Si(100) substrates. These films were post-annealed in a temperature range of 500 °C to 900 °C for 30 s in three different atmospheres—N2, Ar, and forming gas (Ar+H2 (3 vol. %)). Irrespective of the annealing atmosphere, the chemically ordered L10 FePt phase has formed after annealing at 500 °C. Higher annealing temperatures in N2 or Ar atmosphere resulted in a strong increase in grain size and surface roughness but also in the appearance of a pronounced (001) texture in the FePt films. However, these films show the presence of iron oxide. In contrast, annealing in forming gas atmosphere suppressed the oxidation process and resulted in a reduced grain size and lower surface roughness. However, no (001)—but a strong (111)—texture was obtained after annealing at 700 °C, which might be related to the reduced unit cell tetragonality and incorporation of hydrogen to the FePt lattice. Thus, this study clearly demonstrates that the oxygen/hydrogen content plays an important role in controlling the crystallographic orientation during post-annealing.
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28 October 2013
Research Article|
October 28 2013
Influence of the annealing atmosphere on the structural properties of FePt thin films
I. A. Vladymyrskyi;
I. A. Vladymyrskyi
a)
1
Metal Physics Department, National Technical University of Ukraine “KPI”
, Prospect Peremogy 37, 03056 Kyiv, Ukraine
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M. V. Karpets;
M. V. Karpets
2
I. Frantsevich Institute for Problems of Materials Science
, National Academy of Sciences of Ukraine, 3 Krzhizhanovsky Str., 03142 Kyiv, Ukraine
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F. Ganss;
F. Ganss
3
Institute of Physics, Chemnitz University of Technology
, Reichenhainer Street 70, 09126 Chemnitz, Germany
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G. L. Katona;
G. L. Katona
4
Department of Solid State Physics, University of Debrecen
, P.O. Box 2, H-4010 Debrecen, Hungary
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D. L. Beke;
D. L. Beke
4
Department of Solid State Physics, University of Debrecen
, P.O. Box 2, H-4010 Debrecen, Hungary
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S. I. Sidorenko;
S. I. Sidorenko
1
Metal Physics Department, National Technical University of Ukraine “KPI”
, Prospect Peremogy 37, 03056 Kyiv, Ukraine
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T. Nagata;
T. Nagata
5
MANA Foundry and MANA Advanced Device Materials Group, National Institute for Materials Science
, 1-1 Namiki, Tsukuba 305-0044, Japan
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T. Nabatame;
T. Nabatame
5
MANA Foundry and MANA Advanced Device Materials Group, National Institute for Materials Science
, 1-1 Namiki, Tsukuba 305-0044, Japan
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T. Chikyow;
T. Chikyow
5
MANA Foundry and MANA Advanced Device Materials Group, National Institute for Materials Science
, 1-1 Namiki, Tsukuba 305-0044, Japan
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G. Beddies;
G. Beddies
3
Institute of Physics, Chemnitz University of Technology
, Reichenhainer Street 70, 09126 Chemnitz, Germany
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M. Albrecht;
M. Albrecht
3
Institute of Physics, Chemnitz University of Technology
, Reichenhainer Street 70, 09126 Chemnitz, Germany
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Iu. M. Makogon
Iu. M. Makogon
1
Metal Physics Department, National Technical University of Ukraine “KPI”
, Prospect Peremogy 37, 03056 Kyiv, Ukraine
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a)
Author to whom correspondence should be addressed. Electronic mail: [email protected]. Tel.: +380444068218.
J. Appl. Phys. 114, 164314 (2013)
Article history
Received:
September 26 2013
Accepted:
October 11 2013
Citation
I. A. Vladymyrskyi, M. V. Karpets, F. Ganss, G. L. Katona, D. L. Beke, S. I. Sidorenko, T. Nagata, T. Nabatame, T. Chikyow, G. Beddies, M. Albrecht, Iu. M. Makogon; Influence of the annealing atmosphere on the structural properties of FePt thin films. J. Appl. Phys. 28 October 2013; 114 (16): 164314. https://doi.org/10.1063/1.4827202
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