We present a general theoretical methodology and related open-access computer program for carrying out the calculation of photoelectron, Auger electron, and x-ray emission intensities in the presence of several x-ray optical effects, including total reflection at grazing incidence, excitation with standing-waves produced by reflection from synthetic multilayers and at core-level resonance conditions, and the use of variable polarization to produce magnetic circular dichroism. Calculations illustrating all of these effects are presented, including in some cases comparisons to experimental results. Sample types include both semi-infinite flat surfaces and arbitrary multilayer configurations, with interdiffusion/roughness at their interfaces. These x-ray optical effects can significantly alter observed photoelectron, Auger, and x-ray intensities, and in fact lead to several generally useful techniques for enhancing surface and buried-layer sensitivity, including layer-resolved densities of states and depth profiles of element-specific magnetization. The computer program used in this study should thus be useful for a broad range of studies in which x-ray optical effects are involved or are to be exploited in next-generation surface and interface studies of nanoscale systems.
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21 February 2013
Research Article|
February 21 2013
Making use of x-ray optical effects in photoelectron-, Auger electron-, and x-ray emission spectroscopies: Total reflection, standing-wave excitation, and resonant effects
S.-H. Yang;
S.-H. Yang
1
IBM Almaden Research Center
, San Jose, California 95120, USA
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A. X. Gray;
A. X. Gray
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94740, USA
3
Department of Physics, University of California at Davis
, Davis, California 95616, USA
4
Stanford Institute for Materials and Energy Science, Stanford University and SLAC National Accelerator Laboratory
, Menlo Park, California 94025, USA
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A. M. Kaiser;
A. M. Kaiser
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94740, USA
3
Department of Physics, University of California at Davis
, Davis, California 95616, USA
5
Peter Grunberg Institute
, PGI-6, Forschungszentrum Jülich, 52425 Jülich, Germany
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B. S. Mun;
B. S. Mun
6
Advanced Light Source, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
7
Department of Applied Physics, Hanyang University
, Ansan, Gyeonggi 426-791, South Korea
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B. C. Sell;
B. C. Sell
a)
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94740, USA
3
Department of Physics, University of California at Davis
, Davis, California 95616, USA
8
Department of Physics, Otterbein College
, Westerville, Ohio 43081, USA
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J. B. Kortright;
J. B. Kortright
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94740, USA
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C. S. Fadley
C. S. Fadley
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94740, USA
3
Department of Physics, University of California at Davis
, Davis, California 95616, USA
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a)
Present address: Wright-Patterson Air Force Base, Ohio 45433, USA.
J. Appl. Phys. 113, 073513 (2013)
Article history
Received:
August 02 2012
Accepted:
January 15 2013
Citation
S.-H. Yang, A. X. Gray, A. M. Kaiser, B. S. Mun, B. C. Sell, J. B. Kortright, C. S. Fadley; Making use of x-ray optical effects in photoelectron-, Auger electron-, and x-ray emission spectroscopies: Total reflection, standing-wave excitation, and resonant effects. J. Appl. Phys. 21 February 2013; 113 (7): 073513. https://doi.org/10.1063/1.4790171
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