Time-and-space resolved comparison of the expansion velocities of plasmas in the planar diode with cathodes made of carbon velvet and polymer velvet has been performed. The diode was powered by a 200 kV, 110 ns pulse, and the peak current density was nearly 477 A/cm2. A four-channel high speed framing camera (HSFC) was used to observe the formation and subsequent movement of the cathode plasmas. More accurate and valuable information about the two-dimensional (radial and axial) velocity components of the cathode plasmas was also acquired by utilizing the digital image processing methods. Additionally, the perveance model based on the Child-Langmuir law was used to calculate the expansion velocities of the diode plasmas from voltage and current profiles. Results from the two diagnostics were compared. Comparing the average values of the radial and axial velocity components indicated that the former was much larger than the latter during the initial period of the current. It was also found that the radial velocity of the carbon velvet cathode (190 cm/μs) was much larger than that (90 cm/μs) of the polymer velvet cathode. Moreover, the average values of both the radial and axial velocity components of the carbon velvet cathode were typically in the range of 2.5 ± 1.5 cm/μs, which were smaller than that of the polymer velvet cathode during the current flattop. These results, together with the comparison of calculated values from the perveance model, indicated that the diode with carbon velvet cathode was more robust as compared with the polymer velvet cathode for the same electron current densities.
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28 January 2013
Research Article|
January 28 2013
Time-and-space resolved comparison of plasma expansion velocities in high-power diodes with velvet cathodes Available to Purchase
Jie Yang;
Jie Yang
College of Opto-electric Science and Engineering, National University of Defense Technology
, Hunan 410073, China
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Ting Shu;
Ting Shu
College of Opto-electric Science and Engineering, National University of Defense Technology
, Hunan 410073, China
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Yuwei Fan
Yuwei Fan
College of Opto-electric Science and Engineering, National University of Defense Technology
, Hunan 410073, China
Search for other works by this author on:
Jie Yang
College of Opto-electric Science and Engineering, National University of Defense Technology
, Hunan 410073, China
Ting Shu
College of Opto-electric Science and Engineering, National University of Defense Technology
, Hunan 410073, China
Yuwei Fan
College of Opto-electric Science and Engineering, National University of Defense Technology
, Hunan 410073, China
J. Appl. Phys. 113, 043307 (2013)
Article history
Received:
December 01 2012
Accepted:
January 11 2013
Citation
Jie Yang, Ting Shu, Yuwei Fan; Time-and-space resolved comparison of plasma expansion velocities in high-power diodes with velvet cathodes. J. Appl. Phys. 28 January 2013; 113 (4): 043307. https://doi.org/10.1063/1.4789623
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