We present the chemical and structural optimization of ultrathin magnetic oxide EuO films on silicon. By applying a controlled in situ passivation of the Si(001) surface with SiOx in the monolayer regime, metallic silicide contaminations at the interface can be effectively reduced down to a sub-monolayer coverage, as was carefully quantified by interface-sensitive hard x-ray photoemission spectroscopy. Heteroepitaxial growth of EuO on Si(001) is sustained for this ultrathin SiOx-passivation, and bulk-near magnetic properties are observed for the 4 nm-thin EuO films. Our successful combination of chemically and structurally optimized EuO/Si(001) heterostructures by ultrathin in situ SiOx passivation makes this system promising for an application as alternative spin functional tunnel contacts in spin-FETs.
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7 May 2013
PROCEEDINGS OF THE 55TH ANNUAL CONFERENCE ON MAGNETISM AND MAGNETIC MATERIALS
14-18 November 2010
Atlanta, Georgia
Research Article|
Magnetism and Magnetic Materials|
March 13 2013
Ultrathin magnetic oxide EuO films on Si(001) using passivation—Controlled by hard x-ray photoemission spectroscopy
C. Caspers;
C. Caspers
a)
1
Peter Grünberg Institut (PGI-6)
, Forschungszentrum Jülich, 52425 Jülich, Germany
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S. Flade;
S. Flade
1
Peter Grünberg Institut (PGI-6)
, Forschungszentrum Jülich, 52425 Jülich, Germany
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M. Gorgoi;
M. Gorgoi
2
Helmholtz-Zentrum Berlin für Materialien und Energie
, BESSY II, 12489 Berlin, Germany
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A. Gloskovskii;
A. Gloskovskii
3
DESY Photon Science, Deutsches Elektronen-Synchrotron
, 22603 Hamburg, Germany
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W. Drube;
W. Drube
3
DESY Photon Science, Deutsches Elektronen-Synchrotron
, 22603 Hamburg, Germany
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C. M. Schneider;
C. M. Schneider
1
Peter Grünberg Institut (PGI-6)
, Forschungszentrum Jülich, 52425 Jülich, Germany
4
Fakultät für Physik and Center for Nanointegration Duisburg-Essen (CeNIDE)
, 47048 Duisburg, Germany
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M. Müller
M. Müller
1
Peter Grünberg Institut (PGI-6)
, Forschungszentrum Jülich, 52425 Jülich, Germany
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a)
Electronic mail: [email protected].
J. Appl. Phys. 113, 17C505 (2013)
Article history
Received:
October 31 2012
Accepted:
December 12 2012
Citation
C. Caspers, S. Flade, M. Gorgoi, A. Gloskovskii, W. Drube, C. M. Schneider, M. Müller; Ultrathin magnetic oxide EuO films on Si(001) using passivation—Controlled by hard x-ray photoemission spectroscopy. J. Appl. Phys. 7 May 2013; 113 (17): 17C505. https://doi.org/10.1063/1.4795010
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