Phase-resolved optical emission spectroscopy (PROES) is used for the measurement of plasma products in a typical industrial electron cyclotron resonance (ECR) plasma etcher. In this paper, the PROES of oxygen and argon atoms spectral lines are investigated over a wide range of process parameters. The PROES shows a discrimination between the plasma species from gas phase and those which come from the solid phase due to surface etching. The relationship between the micro-wave and radio-frequency generators for plasma creation in the ECR can be better understood by the use of PROES.
REFERENCES
1.
A.
Agarwal
, S.
Rauf
, and K.
Collins
, “Extraction of negative ions from pulsed electronegative capacitively coupled plasmas
,” J. Appl. Phys.
112
, 033303
(2012
).2.
M.
Ambrico
, R.
Di Mundo
, P. F.
Ambrico
, R.
dAgostino
, T.
Ligonzo
, and F.
Palumbo
, “Surface chemistry and morphology effects on optoelectronic transport at metal/nanostructured silicon/silicon structures
,” J. Appl. Phys.
111
, 094903
(2012
).3.
E.
Dilonardo
, G. V.
Bianco
, M. M.
Giangregorio
, M.
Losurdo
, P.
Capezzuto
, and G.
Bruno
, “Silicon doping effect on SF6/O2 plasma chemical texturing
,” J. Appl. Phys.
110
, 013303
(2011
).4.
E.
Stamate
and M.
Draghici
, “High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions
,” J. Appl. Phys.
111
, 083303
(2012
).5.
Y. C.
Liu
, L. T.
Ho
, Y. B.
Bai
, T. J.
Li
, K.
Furakawa
, D. W.
Gao
, H.
Nakashima
, and K.
Muroaka
, “Growth of ultrathin SiO2 on Si by surface irradiation with an O2+Ar electron cyclotron resonance microwave plasma at low temperatures
,” J. Appl. Phys.
85
, 1911
(1999
).6.
N.
Hershkowitz
, “How Langmuir probes work
,” in Plasma Diagnostics
, edited by O.
Auciello
and D. L.
Flamm
(Academic Press
, Boston
, 1989
), Vol. 1
, Chap. 3.7.
A. J. H.
Donné
, C. J.
Barth
, and H.
Weisen
, “Laser-aided plasma diagnostics
,” Fusion Sci. Technol.
53/2
, 397
–430
(2008
).8.
V.
Milosavljević
, R.
Faulkner
, and M. B.
Hopkins
, “Real time sensor for monitoring oxygen in radio-frequency plasma applications
,” Opt. Express
15
(21
), 13913
–13923
(2007
).9.
B.
Du
, N.
Sadeghi
, T. V.
Tsankov
, D.
Luggenhölscher
, and U.
Czarnetzki
, “Temporally resolved optical emission spectroscopic investigations on a nanosecond self-pulsing micro-thin-cathode discharge
,” Plasma Sources Sci. Technol.
21
(4
), 045015
(2012
).10.
Yu.
Ralchenko
, A. E.
Kramida
, J.
Reader
, and NIST ASD Team, NIST Atomic Spectra Database (ver. 4.1.0)
(National Institute of Standards and Technology
, Gaithersburg, MD
, 2013
), available at http://physics.nist.gov/asd.11.
D. M.
Filipović
, B. P.
Marinković
, V.
Pejčev
, and L.
Vušković
, “Electron-impact excitation of argon: I. The 4s′[1/2]1, 4p[1/2]1 and 4p′[1/2]0 states
,” J. Phys. B
33
, 677
(2000
).12.
D. R.
Juliano
, D. N.
Ružić
, M. M. C.
Allain
, and D. B.
Hayden
, “Influences on ionization fraction in an inductively coupled ionized physical vapor deposition device plasma
,” J. Appl. Phys.
91
(2
), 605
–612
(2002
).13.
V.
Milosavljević
, A. R.
Ellingboe
, and S.
Daniels
, “Influence of plasma chemistry on oxygen triplets
,” Eur. Phys. J. D
64
, 437
–445
(2011
).© 2013 AIP Publishing LLC.
2013
AIP Publishing LLC
You do not currently have access to this content.
