The experimental determination of valence band offsets (VBOs) at interfaces in complex-oxide heterostructures using conventional soft x-ray photoelectron spectroscopy (SXPS, hν ≤ 1500 eV) and reference core-level binding energies can present challenges because of surface charging when photoelectrons are emitted and insufficient probing depth to clearly resolve the interfaces. In this paper, we compare VBOs measured with SXPS and its multi-keV hard x-ray analogue (HXPS, hν > 2000 eV). We demonstrate that the use of HXPS allows one to minimize charging effects and to probe more deeply buried interfaces in heterostructures such as SrTiO3/LaNiO3 and SrTiO3/GdTiO3. The VBO values obtained by HXPS for these interfaces are furthermore found to be close to those determined by first-principles calculations.
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14 April 2013
Research Article|
April 08 2013
Band offsets in complex-oxide thin films and heterostructures of SrTiO3/LaNiO3 and SrTiO3/GdTiO3 by soft and hard X-ray photoelectron spectroscopy
G. Conti;
G. Conti
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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A. M. Kaiser;
A. M. Kaiser
a)
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
3
Peter-Grünberg-Institut PGI-6
, Forschungszentrum Jülich, 52425 Jülich, Germany
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A. X. Gray;
A. X. Gray
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
4
Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory
, Menlo Park, California 94025, USA
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S. Nemšák;
S. Nemšák
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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G. K. Pálsson;
G. K. Pálsson
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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J. Son;
J. Son
5
Materials Department, University of California
, Santa Barbara, California 93106, USA
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P. Moetakef;
P. Moetakef
5
Materials Department, University of California
, Santa Barbara, California 93106, USA
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A. Janotti;
A. Janotti
5
Materials Department, University of California
, Santa Barbara, California 93106, USA
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L. Bjaalie;
L. Bjaalie
5
Materials Department, University of California
, Santa Barbara, California 93106, USA
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C. S. Conlon;
C. S. Conlon
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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D. Eiteneer;
D. Eiteneer
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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A. A. Greer;
A. A. Greer
1
Department of Physics, University of California
, Davis, California 95616, USA
6
Chemical Engineering and Materials Science Engineering, University of California
, Davis California 95616, USA
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A. Keqi;
A. Keqi
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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A. Rattanachata;
A. Rattanachata
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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A. Y. Saw;
A. Y. Saw
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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A. Bostwick;
A. Bostwick
7
Advanced Light Source, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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W. C. Stolte;
W. C. Stolte
7
Advanced Light Source, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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A. Gloskovskii;
A. Gloskovskii
8
Deutsches Elektronen-Synchrotron DESY
, 22607 Hamburg, Germany
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W. Drube;
W. Drube
8
Deutsches Elektronen-Synchrotron DESY
, 22607 Hamburg, Germany
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S. Ueda;
S. Ueda
9
Synchrotron X-ray Station at SPring-8, National Institute for Materials Science
, Hyogo 679-5148, Japan
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M. Kobata;
M. Kobata
10
Quantum Beam Science Directrate, Japan Atomic Energy Agency Kouto 1-1-1
, SPring-8 Hyogo 679-5148, Japan
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K. Kobayashi;
K. Kobayashi
9
Synchrotron X-ray Station at SPring-8, National Institute for Materials Science
, Hyogo 679-5148, Japan
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C. G. Van de Walle;
C. G. Van de Walle
5
Materials Department, University of California
, Santa Barbara, California 93106, USA
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S. Stemmer;
S. Stemmer
5
Materials Department, University of California
, Santa Barbara, California 93106, USA
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C. M. Schneider;
C. M. Schneider
3
Peter-Grünberg-Institut PGI-6
, Forschungszentrum Jülich, 52425 Jülich, Germany
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C. S. Fadley
C. S. Fadley
1
Department of Physics, University of California
, Davis, California 95616, USA
2
Materials Sciences Division, Lawrence Berkeley National Laboratory
, Berkeley, California 94720, USA
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a)
Present address: SPECS Surface Nano Analysis GmbH, Voltastraße 5, 13355 Berlin, Germany.
J. Appl. Phys. 113, 143704 (2013)
Article history
Received:
January 13 2013
Accepted:
March 04 2013
Citation
G. Conti, A. M. Kaiser, A. X. Gray, S. Nemšák, G. K. Pálsson, J. Son, P. Moetakef, A. Janotti, L. Bjaalie, C. S. Conlon, D. Eiteneer, A. A. Greer, A. Keqi, A. Rattanachata, A. Y. Saw, A. Bostwick, W. C. Stolte, A. Gloskovskii, W. Drube, S. Ueda, M. Kobata, K. Kobayashi, C. G. Van de Walle, S. Stemmer, C. M. Schneider, C. S. Fadley; Band offsets in complex-oxide thin films and heterostructures of SrTiO3/LaNiO3 and SrTiO3/GdTiO3 by soft and hard X-ray photoelectron spectroscopy. J. Appl. Phys. 14 April 2013; 113 (14): 143704. https://doi.org/10.1063/1.4795612
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