Magnetostriction constant of a magnetic thin film is conventionally measured by detecting the deformation of a coupon sample that consists of the magnetic film deposited on a thin glass substrate (e.g., cover glass of size 10 mm × 25 mm) under an applied field using a laser beam [A. C. Tam and H. Schroeder, J. Appl. Phys. 64, 5422 (1988)]. This method, however, cannot be applied to films deposited on actual large-size substrates (wafers) with diameter from 3 to 6 in. or more. In a previous paper [Okita et al., J. Phys.: Conf. Ser. 200, 112008 (2010)], the authors presented a method for measuring magnetostriction of a magnetic thin film deposited on an actual substrate by detecting the change of magnetic anisotropy field, Hk, under mechanical bending of the substrate. It was validated that the method is very effective for measuring the magnetostriction constant of a free layer on the actual substrate. However, since a Ni-Fe shield layer usually covers a magnetic head used for a hard disk drive, this shield layer disturbs the effective measurement of R-H curve under minor loop. Therefore, a high magnetic field that can saturate the magnetic material in the shield layer should be applied to the head in order to measure the magnetostriction constant of a pinned layer under the shield layer. In this paper, this method was applied to the measurement of the magnetostriction constant of a pinned layer under the shield layer by using a high magnetic field up to 320 kA/m (4 kOe).
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1 April 2012
PROCEEDINGS OF THE 55TH ANNUAL CONFERENCE ON MAGNETISM AND MAGNETIC MATERIALS
14-18 November 2010
Atlanta, Georgia
Research Article|
Magnetism and Magnetic Materials|
March 09 2012
Magnetostriction measurement of a giant magnetoresistance film on a practical substrate covered by a shield layer
Kazuhiko Okita;
Kazuhiko Okita
a)
1
Industrial Instrumentation Division
, Tohoku Steel Co., Ltd., Miyagi, Japan
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Kazushi Ishiyama;
Kazushi Ishiyama
2Research Institute of Electrical Communication,
Tohoku University
, Sendai, Japan
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Hideo Miura
Hideo Miura
3Department of Nanomechanics, Graduate School of Engineering,
Tohoku University
, Sendai, Japan
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a)
Author to whom correspondence should be addressed. Electronic mail: soushi@sm.rim.or.jp.
J. Appl. Phys. 111, 07E340 (2012)
Article history
Received:
October 12 2011
Accepted:
November 28 2011
Citation
Kazuhiko Okita, Kazushi Ishiyama, Hideo Miura; Magnetostriction measurement of a giant magnetoresistance film on a practical substrate covered by a shield layer. J. Appl. Phys. 1 April 2012; 111 (7): 07E340. https://doi.org/10.1063/1.3678445
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