[Co (tCo) nm/Cu 1.5 nm]50 multilayers were grown onto 15-nm Cu/polyimide buffer layers. The relationship between stress, , and strain, , for the [Co 1.0 nm/Cu 1.5 nm]50 multilayers has been presented. The effects of induced strain on the magnetoresistance (MR) and magnetic anisotropy have been examined. The [Co 1.0 nm/Cu 1.5 nm]50 multilayer exhibited a maximum MR ratio of 3.4% at a Co layer thickness of 1.0 nm, of 0.1, and a strain of 1.5%. The multilayers exhibited a remarkable magnetic anisotropy with the easy axis of magnetization always lying in a plane perpendicular to the direction of the induced strain.
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Research Article| Magnetism and Magnetic Materials| February 15 2012
Strain-induced magnetoresistance and magnetic anisotropy properties of Co/Cu multilayers
C. Rizal, P. Gyawali, I. Kshattry, R. K. Pokharel; Strain-induced magnetoresistance and magnetic anisotropy properties of Co/Cu multilayers. J. Appl. Phys. 1 April 2012; 111 (7): 07C107. https://doi.org/10.1063/1.3671788
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