When electric current flows in a solder bump, electromigration generates stress, but creep relaxes it. After some time, the bump develops a steady-state stress field. We present a theory to show that the two processes — electromigration and creep — set an intrinsic length. When the intrinsic length is large compared to the height of the bump, electromigration is fast relative to creep and the steady-state stress field is linearly distributed in the bump. When the intrinsic length is small compared to the height of the bump, electromigration is slow relative to creep and the steady-state stress field nearly vanishes in the bump, except in a thin layer along the boundary of the bump. We further show that a critical electric current exists, below which the bump can sustain the steady-state stress field without forming voids. Theoretical predictions are compared with existing experimental observations.
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15 October 2011
Research Article|
October 28 2011
Concurrent electromigration and creep in lead-free solder
Matt Pharr;
Matt Pharr
1School of Engineering and Applied Sciences and Kavli Institute,
Harvard University
, Cambridge, Massachusetts 02138, USA
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Kejie Zhao;
Kejie Zhao
1School of Engineering and Applied Sciences and Kavli Institute,
Harvard University
, Cambridge, Massachusetts 02138, USA
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Zhigang Suo;
Zhigang Suo
a)
1School of Engineering and Applied Sciences and Kavli Institute,
Harvard University
, Cambridge, Massachusetts 02138, USA
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Fan-Yi Ouyang;
Fan-Yi Ouyang
2
Intel Corporation, Assembly Technology Development Center
, Chandler, Arizona 85226, USA
3Department of Engineering and System Science,
National Tsing Hua University
, Hsinchu 300, Taiwan
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Pilin Liu
Pilin Liu
2
Intel Corporation, Assembly Technology Development Center
, Chandler, Arizona 85226, USA
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a)
Author to whom correspondence should be addressed. Electronic mail: [email protected].
J. Appl. Phys. 110, 083716 (2011)
Article history
Received:
July 18 2011
Accepted:
September 13 2011
Citation
Matt Pharr, Kejie Zhao, Zhigang Suo, Fan-Yi Ouyang, Pilin Liu; Concurrent electromigration and creep in lead-free solder. J. Appl. Phys. 15 October 2011; 110 (8): 083716. https://doi.org/10.1063/1.3656002
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