Nitrogenated carbon nanotips with a low atomic concentration of nitrogen have been synthesized by using a custom-designed plasma-enhanced hot-filament plasma chemical vapor deposition system. The properties (including morphology, structure, composition, photoluminescence, etc.) of the synthesized nitrogenated carbon nanotips are investigated using advanced characterization tools. The room-temperature photoluminescence measurements show that the nitrogenated carbon nanotips can generate two distinct broad emissions located at ∼405 and ∼507 nm, respectively. Through the detailed analysis, it is shown that these two emission bands are attributed to the transition between the lone pair valence and σ* bands, which are related to the sp3 and sp2 C–N bonds, respectively. These results are highly relevant to advanced applications of nitrogenated carbon nanotips in light emitting optoelectronic devices.
REFERENCES
1.
K.
Ostrikov
, Rev. Mod. Phys.
77
, 489
(2005
).2.
U.
Cvelbar
, J. Phys. D: Appl. Phys.
44
, 174014
(2011
).3.
Q. J.
Cheng
, S.
Xu
, J. D.
Long
, and K.
Ostrikov
, Appl. Phys. Lett.
90
, 173112
(2007
).4.
S.
Xu
, I.
Levchenko
, S. Y.
Huang
, and K.
Ostrikov
, Appl. Phys. Lett.
95
, 111505
(2009
).5.
K.
Ostrikov
, J. Phys. D: Appl. Phys.
44
, 174003
(2011
).6.
X. X.
Zhong
, X.
Wu
, and K.
Ostrikov
, Plasma Process. Polym.
6
, 161
(2009
).7.
M.
Keidar
, I.
Levchenko
, T.
Arbel
, M.
Alexander
, A. M.
Waas
, and K.
Ostrikov
, Appl. Phys. Lett.
92
, 043129
(2008
).8.
Z. L.
Tsakadze
, K.
Ostrikov
, C. H.
Sow
, S. G.
Mhaisalkar
, and Y. C.
Boey
, J. Nanosci. Nanotechnol.
10
, 6575
(2010
).9.
B. B.
Wang
, K.
Ostrikov
, Z. L.
Tsakadze
, and S.
Xu
, J. Appl. Phys.
106
, 013315
(2009
).10.
G. Y.
Zhang
, X.
Jiang
, and E. G.
Wang
, Science
300
, 472
(2003
).11.
J.
Jang
, S. J.
Chung
, H. S.
Kim
, S. H.
Lim
, and C. H.
Lee
, Appl. Phys. Lett.
79
, 1682
(2001
).12.
J. X.
Wei
, K. M.
Liew
, and X. Q.
He
, Appl. Phys. Lett.
91
, 261906
(2007
).13.
K. S.
Yeong
, C. B.
Boothrody
, and J. T. L.
Thong
, Nanotechnology
17
, 3655
(2006
).14.
H.
Park
, S.
Choi
, S.
Lee
, and K. H.
Koh
, J. Vac. Sci. Technol. B
23
, 1290
(2004
).15.
Z. L.
Tsakadze
, I.
Levchenko
, K.
Ostrikov
, and S.
Xu
, Carbon
45
, 2022
(2007
).16.
I. B.
Denysenko
, S.
Xu
, J. D.
Long
, P. P.
Rutkevch
, N. A.
Azarenkov
, and K.
Ostrikov
, J. Appl. Phys.
95
, 2713
(2004
).17.
P.
Rai
, D. R.
Mohapatra
, K. S.
Hazra
, D. S.
Misra
, and S. P.
Tiwari
, Appl. Phys. Lett.
93
, 131921
(2008
).18.
Z. L.
Tsakadze
, K.
Ostrikov
, J. D.
Long
, and S.
Xu
, Diam. Relat. Mater.
13
, 1923
(2004
).19.
Y.
Lin
, B.
Zhou
, R. B.
Martin
, K. B.
Henbest
, B. A.
Harruff
, J. E.
Riggs
, Z. X.
Guo
, L. F.
Allard
, and Y. P.
Sun
, J. Phys. Chem. B
109
, 14779
(2005
).20.
J.
Lefebvre
, Y.
Homma
, and P.
Finnie
, Phys. Rev. Lett.
90
, 217401
(2003
).21.
J. E.
Riggs
, Z.
Guo
, D. L.
Carroll
, and Y. P.
Sun
, J. Am. Chem. Soc.
122
, 5879
(2000
).22.
B. B.
Wang
and K.
Ostrikov
, J. Appl. Phys.
105
, 083303
(2009
).23.
Q. J.
Cheng
, S.
Xu
, and K.
Ostrikov
, J. Mater. Chem.
20
, 5853
(2010
).24.
Q. J.
Cheng
, S.
Xu
, and K.
Ostrikov
, Acta Mater.
58
, 560
(2010
).25.
T. M.
Chen
, F. M.
Pan
, J. Y.
Hung
, L.
Chang
, S. C.
Wu
, and C. F.
Chen
, J. Electrochem. Soc.
154
, D215
(2007
).26.
I. I.
Vlasov
, V. G.
Ralchenko
, E.
Goovaerts
, A. V.
Saveliev
, and M. V.
Kanzyuba
, Phys. Status Solidi A
203
, 3028
(2006
).27.
Y.
Xie
, N. C.
Morosoff
, and W. J.
James
, J. Nucl. Mater.
289
, 48
(2001
).28.
W. T.
Zhang
, P. J.
Cao
, J. J.
Li
, X.
Wang
, and Z. S.
Jin
, Surf. Coat. Technol.
173
, 213
(2003
).29.
S. D.
Gardner
, G.
He
, and C. U.
Pittman
, Carbon
34
, 1221
(1996
).30.
C. Q.
Sun
, Prog. Mater. Sci.
54
, 179
(2009
).31.
J.
Xu
, J.
Mei
, X.
Huang
, W.
Li
, Z.
Li
, X.
Li
, and K.
Chen
, J. Non-Cryst. Solids
338–340
, 481
(2004
).32.
M.
Füle
, J.
Budai
, S.
Tóth
, M.
Veres
, and M.
Koós
, J. Non-Cryst. Solids
352
, 1340
(2006
).33.
D.
Papadimitriou
, G.
Roupakas
, C.
Xue
, A.
Topalidou
, Y.
Panayiotatos
, C. A.
Dinitriadis
, and S.
Logothetidis
, Thin Solid Films
414
, 18
(2002
).34.
Y.
Iwano
, T.
Kittaka
, H.
Tabuch
, M.
Soukawa
, S.
Kunitsugu
, K.
Takarabe
, and K.
Itoh
, Jpn. J. Appl. Phys.
47
, 7842
(2008
).35.
G.
Fanchini
, A.
Tagliaferro
, N. M. J.
Conway
, and G.
Godet
, Phys. Rev. B
66
, 195415
(2002
).36.
W. T.
Zhang
, J. J.
Li
, X.
Wang
, Z. S.
Jin
, B. K.
Tay
, and C. Q.
Sun
, J. Appl. Phys.
94
, 2741
(2003
).37.
S.
Souto
, M.
Pickholz
, M. C.
dos Santos
, and F.
Alvarez
, Phys. Rev. B
57
, 2536
(1998
).38.
T.
Katsuno
, S.
Nitta
, H.
Habuchi
, V.
Stolojan
, and S. R. P.
Silva
, Appl. Phys. Lett.
85
, 2803
(2004
).39.
G.
Fanchini
, G.
Messina
, A.
Paoletti
, S. C.
Ray
, S.
Santangelo
, A.
Tagliaferro
, and A.
Tucciarone
, Surf. Coat. Technol.
151–152
, 257
(2002
).40.
L.
Bergman
, M. T.
McClure
, J. T.
Glass
, and R. J.
Nemanich
, J. Appl. Phys.
76
, 3020
(1994
).41.
R. J.
Graham
and K. V.
Ravi
, Appl. Phys. Lett.
60
, 1310
(1992
).42.
S. C.
Ray
, G.
Fanchini
, and A.
Tagliaferro
, J. Mater. Sci.
40
, 5451
(2005
).43.
M.
Xu
, S.
Xu
, J. W.
Chai
, J. D.
Long
, and Y. C.
Ee
, Appl. Phys. Lett.
89
, 251904
(2006
).44.
S.
Xu
, H. S.
Li
, Y. A.
Li
, S.
Lee
, and C. H. A.
Huan
, Chem. Phys. Lett.
287
, 731
(1998
).45.
Y.
Sakamoto
and M.
Takaya
, Thin Solid Films
475
, 198
(2005
).46.
K.
Ostrikov
, H. J.
Yoon
, A. E.
Rider
, and S. V.
Vladimirov
, Plasma Processes Polym.
4
, 27
(2007
).© 2011 American Institute of Physics.
2011
American Institute of Physics
You do not currently have access to this content.
