We demonstrate the fabrication of surface profile-controlled close-packed Si nanorod arrays (NRAs), using a scalable and integrated circuit compatible process combining colloidal lithography and reactive ion etching. Si NRAs exhibit broadband, omnidirectional, and polarization-insensitive antireflection (AR) properties and enhance the hydrophobicity. The effect of surface profiles of periodic NRAs on the AR and hydrophobicity was investigated systematically. The Si NRAs function as both self-cleaning and AR layers, which offer a promising approach to enhance the solar cell energy conversion efficiency.
REFERENCES
1.
Y. -F.
Huang
, S.
Chattopadhyay
, Y. -J.
Jen
, C. -Y.
Peng
, T. -A.
Liu
, Y. -K.
Hsu
, C. -L.
Pan
, H. -C.
Lo
, C. -H.
Hsu
, Y. -H.
Chang
, C. -S.
Lee
, K. -H.
Chen
, and L. -C.
Chen
, Nat. Nanotechnol.
2
, 770
(2007
).2.
J. Y.
Huang
, X.
Wang
, and Z. -L.
Wang
, Nano Lett.
6
, 2325
(2006
).3.
H.
Xu
, N.
Lu
, D.
Qi
, J.
Hao
, L.
Gao
, B.
Zhang
, and L.
Chi
, Small
4
, 1972
(2008
).4.
J. Y.
Huang
, X. D.
Wang
, and Z. L.
Wang
, Nanotechnology
19
, 025602
(2008
).5.
J. Q.
Xi
, M. F.
Schubert
, J. K.
Kim
, E. F.
Schubert
, M.
Chen
, S. -Y.
Lin
, W.
Liu
, and J. A.
Smart
, Nat. Photonics
1
, 176
(2007
).6.
S. L.
Diedenhofen
, G.
Vecchi
, R. E.
Algra
, A.
Hartsuiker
, O. L.
Muskens
, G.
Immink
, E.
Bakkers
, E. W.
Vos
, and J. E.
Rivas
, Adv. Mater. (Weinheim, Ger.)
21
, 973
(2009
).7.
D. G.
Stavenga
, S.
Foletti
, G.
Palasantzas
, and K.
Arikawa
, Proc. R. Soc. London, Ser. B
273
, 661
(2006
).8.
D. H.
Macdonald
, A.
Cuevas
, M. J.
Kerr
, C.
Samundsett
, D.
Ruby
, S.
Winderbaum
, and A.
Leo
, Sol. Energy
76
, 277
(2003
).9.
H. L.
Chen
, S. Y.
Chuang
, C. H.
Lin
, and Y. H.
Lin
, Opt. Express
15
, 14793
(2007
).10.
S. H.
Zaidi
, D. S.
Ruby
, and J. M.
Gee
, IEEE Trans. Electron Devices
48
, 1200
(2001
).11.
S. A.
Boden
and D. M.
Bagnall
, Appl. Phys. Lett.
93
, 133108
(2008
).12.
K.
Hadobás
, S.
Kirsch
, A.
Carl
, M.
Acet
, and E. F.
Wassermann
, Nanotechnology
11
, 161
(2000
).13.
Z.
Yu
, H.
Gao
, W.
Wu
, H.
Ge
, and S. Y.
Chou
, J. Vac. Sci. Technol. B
21
, 2874
(2003
).14.
I.
Montanari
, A.
Nogueira
, J.
Nelson
, J. R.
Durrant
, C.
Winder
, M. A.
Loi
, N. S.
Sariciftci
, and C.
Brabec
, Appl. Phys. Lett.
81
, 3001
(2002
).15.
J.
Zhao
, A.
Wang
, M.
Green
, and F.
Ferrazza
, Appl. Phys. Lett.
73
, 1991
(1998
).16.
C. H.
Chang
, P. C.
Yu
, and C. S.
Yang
, Appl. Phys. Lett.
94
, 051114
(2009
).17.
W.
Chen
, A. Y.
Fadeev
, M. C.
Hsieh
, D.
Oner
, J.
Youngblood
, and T. J.
McCarthy
, Langmuir
15
, 3395
(1999
).18.
W. -L.
Min
, B.
Jiang
, and P.
Jiang
, Adv. Mater. (Weinheim, Ger.)
20
, 3914
(2008
).19.
W. -L.
Min
, B.
Jiang
, and P.
Jiang
, Nanotechnology
19
, 475604
(2008
).20.
Y.
Kanamori
, K.
Hane
, H.
Sai
, and H.
Yugami
, Appl. Phys. Lett.
78
, 142
(2001
).21.
S.
Adachi
, J. Appl. Phys.
66
, 3224
(1989
).22.
N.
Layadi
, V. M.
Donnelly
, J. T. C.
Lee
, and F. P.
Klemens
, J. Vac. Sci. Technol. A
15
, 604
(1997
).23.
J.
Turunen
and F.
Wyrowski
, Diffractive Optics for Industrial and Commercial Applications
(Akademie
, Berlin
, 1997
).24.
A.
Poruba
, A.
Fejfar
, Z.
Remes
, J.
Springer
, M.
Vanecek
, J.
Kocka
, J.
Meier
, P.
Torres
, and A.
Shah
, J. Appl. Phys.
88
, 148
(2000
).25.
I.
Ohlidal
, F.
Lukes
, and K.
Navratil
, Surf. Sci.
45
, 91
(1974
).26.
P.
Beckman
and A.
Spizzichno
, The Scattering of Electromagnetic Waves from Rough Surfaces
(Pergamon
, Oxford
, 1963
).27.
H.
Yoshida
, Y.
Terada
, H.
Miyake
, and K.
Hiramatsu
, Jpn. J. Appl. Phys., Part 2
41
, L1134
(2002
).28.
L.
Hu
and G.
Chen
, Nano Lett.
7
, 3249
(2007
).29.
G. W.
Kattawar
and M.
Eisner
, Appl. Opt.
9
, 2685
(1970
).30.
R. N.
Wenzel
, Ind. Eng. Chem.
28
, 988
(1936
).© 2009 American Institute of Physics.
2009
American Institute of Physics
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