The plasma of a high power impulse magnetron sputtering system has been investigated using a time-of-flight spectrometer. The target materials included high sputter yield materials (Cu, Ag), transition metals (Nb, Cr, Ti), and carbon (graphite); the sputtering gases were argon, krypton, and nitrogen, and two different target thicknesses were selected to consider the role of the magnetic field strength. Measurements for selected combinations of those parameters give quantitative information on the transition from gas-dominated to metal-dominated (self-sputtering) plasma, on the fractions of ion charge states, and in the case of molecular gases, on the fraction of atomic and molecular ions.
REFERENCES
1.
A. P.
Ehiasarian
, R.
New
, W. -D.
Münz
, L.
Hultman
, U.
Helmersson
, and V.
Kouznetsov
, Vacuum
65
, 147
(2002
).2.
J.
Bohlmark
, J. T.
Gudmundsson
, J.
Alami
, M.
Lattemann
, and U.
Helmersson
, IEEE Trans. Plasma Sci.
33
, 346
(2005
).3.
J.
Bohlmark
, M.
Lattemann
, J. T.
Gudmundsson
, A. P.
Ehiasarian
, Y.
Aranda Gonzalvo
, N.
Brenning
, and U.
Helmersson
, Thin Solid Films
515
, 1522
(2006
).4.
S.
Konstantinidis
, A.
Ricard
, M.
Ganciu
, J. P.
Dauchot
, C.
Ranea
, and M.
Hecq
, J. Appl. Phys.
95
, 2900
(2004
).5.
D. J.
Christie
, J. Vac. Sci. Technol. A
23
, 330
(2005
).6.
A.
Anders
, J.
Andersson
, and A.
Ehiasarian
, J. Appl. Phys.
102
, 113303
(2007
).7.
A.
Anders
, J.
Andersson
, and A.
Ehiasarian
, J. Appl. Phys.
103
, 039901
(2008
).8.
J.
Vlček
, P.
Kudláček
, K.
Burcalová
, and J.
Musil
, J. Vac. Sci. Technol. A
25
, 42
(2007
).9.
10.
J.
Andersson
, A. P.
Ehiasarian
, and A.
Anders
, Appl. Phys. Lett.
93
, 071504
(2008
).11.
A. P.
Ehiasarian
, P. E.
Hovsepian
, L.
Hultman
, and U.
Helmersson
, Thin Solid Films
457
, 270
(2004
).12.
J.
Alami
, P.
Eklund
, J. M.
Andersson
, M.
Lattemann
, E.
Wallin
, J.
Bohlmark
, P.
Persson
, and U.
Helmersson
, Thin Solid Films
515
, 3434
(2007
).13.
A. P.
Ehiasarian
, J. G.
Wen
, and I.
Petrov
, J. Appl. Phys.
101
, 054301
(2007
).14.
N.
Hosokawa
, T.
Tsukada
, and T.
Misumi
, J. Vac. Sci. Technol.
14
, 143
(1977
).15.
W. M.
Posadowski
and Z.
Radzimski
, J. Vac. Sci. Technol. A
11
, 2980
(1993
).16.
W. M.
Posadowski
, A.
Wiatrowski
, J.
Dora
, and Z. J.
Radzimski
, Thin Solid Films
516
, 4478
(2008
).17.
A.
Wiatrowski
, W. M.
Posadowski
, and Z. J.
Radzimski
, J. Vac. Sci. Technol. A
26
, 1277
(2008
).18.
V.
Kouznetsov
, K.
Macak
, J. M.
Schneider
, U.
Helmersson
, and I.
Petrov
, Surf. Coat. Technol.
122
, 290
(1999
).19.
J.
Bohlmark
, J.
Alami
, C.
Christou
, A.
Ehiasarian
, and U.
Helmersson
, J. Vac. Sci. Technol. A
23
, 18
(2005
).20.
J.
Vlcek
, A. D.
Pajdarova
, and J.
Musil
, Contrib. Plasma Phys.
44
, 426
(2004
).21.
G. Y.
Yushkov
and A.
Anders
, Appl. Phys. Lett.
92
, 041502
(2008
).22.
A.
Anders
and G. Y.
Yushkov
, J. Appl. Phys.
91
, 4824
(2002
).23.
E.
Oks
, G. Y.
Yushkov
, and A.
Anders
, Rev. Sci. Instrum.
79
, 02B301
(2008
).24.
25.
The Physics and Technology of Ion Sources
, edited by I. G.
Brown
(Wiley-VCH
, Weinheim
, 2004
).26.
I. G.
Brown
, J. E.
Galvin
, R. A.
MacGill
, and R. T.
Wright
, Rev. Sci. Instrum.
58
, 1589
(1987
).27.
J.
Andersson
and A.
Anders
, Appl. Phys. Lett.
92
, 221503
(2008
).28.
J.
Andersson
and A.
Anders
, Phys. Rev. Lett.
102
, 045003
(2009
).29.
N.
Hosokawa
, T.
Tsukada
, and H.
Kitahara
, Proceedings of the Eighth International Vacuum Congress
, Le Vide, Cannes, France, 1980
(unpublished), pp. 11
–14
.30.
A.
Anders
, J.
Andersson
, D.
Horwat
, and A.
Ehiasarian
, The Ninth International Symposium on Sputtering and Plasma Processes—ISSP 2007
, Kanazawa, Japan, 6–8 June 2007
(unpublished), pp. 195
–200
.31.
S. M.
Rossnagel
, J. Vac. Sci. Technol. A
6
, 19
(1988
).32.
G. M.
Turner
, J. Vac. Sci. Technol. A
13
, 2161
(1995
).33.
Z.
Wang
, S. A.
Cohen
, D. N.
Ruzic
, and M. J.
Goeckner
, Phys. Rev. E
61
, 1904
(2000
).34.
35.
G.
Laktis
, F.
Aumayr
, and H.
Winter
, Journal de Physique
50
, Colloque C1, Suppl. 1, 533
(1989
).36.
J.
Robertson
, Mater. Sci. Eng. R.
37
, 129
(2002
).37.
B. M.
DeKoven
, P. R.
Ward
, R. E.
Weiss
, D. J.
Christie
, R. A.
Scholl
, W. D.
Sproul
, F.
Tomasel
, and A.
Anders
, 46th Annual Technical Conference of the Society of Vacuum Coaters
, San Francisco, CA, Society of Vacuum Coaters, 2003
(unpublished), pp. 158
–165
.© 2009 American Institute of Physics.
2009
American Institute of Physics
You do not currently have access to this content.