We investigate the exchange bias fields and compositional depth profiles of the NiFe (bottom)/ (top) trilayers after a thermal treatment at different annealing temperatures. Interestingly, the magnetic hysteresis measurement revealed that the trilayers exhibit a contrasting variation of the exchange bias fields at the two interfaces in a completely different way to each other. High angle x-ray diffraction indicates that there is no distinguishable effect of a thermal treatment on the NiFe (111) and FeMn (111) peaks. The Ni and Mn x-ray photoelectron spectroscopy (XPS) spectrums near these two interfaces along with the XPS compositional depth profiles are measured. We find the asymmetric depth profiles of the Fe and Mn atoms throughout the FeMn layer and the preferential Mn diffusion into the NiFe layer compared to the CoFe layer. We believe that in situ applied fields during sample growth and ex situ cooling fields after sample growth have a different effect on the exchange bias fields of both top and bottom interfaces.
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1 April 2009
PROCEEDINGS OF THE 53RD ANNUAL CONFERENCE ON MAGNETISM AND MAGNETIC MATERIALS
10-14 November 2008
Austin, Texas (USA)
Research Article|
Magnetism and Magnetic Materials|
February 26 2009
Exchange bias and compositional depth profiles of annealed trilayers
Ki-Yeon Kim;
Ki-Yeon Kim
a)
1Neutron Science Division,
Korea Atomic Energy Research Institute
, Daejeon 305-353, Republic of Korea
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Hyeok-Cheol Choi;
Hyeok-Cheol Choi
2Department of Physics,
Inha University
, Incheon 402-751, Republic of Korea
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Chun-Yeol You;
Chun-Yeol You
2Department of Physics,
Inha University
, Incheon 402-751, Republic of Korea
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Jeong-Soo Lee
Jeong-Soo Lee
1Neutron Science Division,
Korea Atomic Energy Research Institute
, Daejeon 305-353, Republic of Korea
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a)
Electronic mail: [email protected].
J. Appl. Phys. 105, 07D715 (2009)
Article history
Received:
September 22 2008
Accepted:
November 08 2008
Citation
Ki-Yeon Kim, Hyeok-Cheol Choi, Chun-Yeol You, Jeong-Soo Lee; Exchange bias and compositional depth profiles of annealed trilayers. J. Appl. Phys. 1 April 2009; 105 (7): 07D715. https://doi.org/10.1063/1.3068628
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