An analytical model for the capacitance between a probe tip and a dielectric film is presented based on the high-frequency electromagnetic-field simulation of the three-dimensional tip and dielectric film system. We examined the effects of the probe-tip geometry and film properties on the tip-sample capacitance and deduced empirically the analytical model expressed by a simple logarithmic dependence on the tip-film distance, . Furthermore, the parameters in the analytical model could describe the probe-tip shape, dielectric permittivity, and film thickness. Based on these results, we discuss the capabilities to probe quantitatively the nanoscale dielectric properties of a thin film.
REFERENCES
1.
C. C.
Williams
, W. P.
Hough
, and S. A.
Rishton
, Appl. Phys. Lett.
55
, 203
(1989
).2.
R. C.
Barrett
and C. F.
Quate
, J. Appl. Phys.
70
, 2725
(1991
).3.
Y.
Cho
, A.
Kirihara
, and T.
Saeki
, Rev. Sci. Instrum.
67
, 2297
(1996
).4.
Y.
Cho
, K.
Fujimoto
, Y.
Hiranaga
, Y.
Wagatsuma
, A.
Onoe
, K.
Terabe
, and K.
Kitamura
, Appl. Phys. Lett.
81
, 4401
(2002
).5.
P. A.
Rosenthal
, Y.
Taur
, and E. T.
Yu
, Appl. Phys. Lett.
81
, 3993
(2002
).6.
T.
Matsukawa
, C.
Yasumuro
, M.
Masahara
, H.
Tanoue
, and S.
Kanemaru
, Appl. Phys. Lett.
84
, 3169
(2004
).7.
C. C.
Leu
, C. H.
Chien
, C. Y.
Chen
, M. N.
Chang
, F. Y.
Hsu
, C. T.
Hu
, and Y. F.
Chen
, Appl. Phys. Lett.
86
, 092906
(2005
).8.
K.
Ohara
and Y.
Cho
, J. Appl. Phys.
96
, 7460
(2004
).9.
W.
Brezna
, S.
Harasek
, A.
Lugstein
, T.
Leitner
, H.
Hoffmann
, E.
Bertagnolli
, and J.
Smoliner
, J. Appl. Phys.
92
, 2144
(2002
).10.
G. D.
Wilk
, R. M.
Wallace
, and J. M.
Anthony
, J. Appl. Phys.
89
, 5243
(2001
).11.
Y.
Shimamoto
, K.
Kushida-Abedelghafar
, H.
Miki
, and Y.
Fujisaki
, Appl. Phys. Lett.
70
, 3096
(1997
).12.
A.
Beck
, J. G.
Bednorz
, Ch.
Gerber
, C.
Rossel
, and D.
Widmer
, Appl. Phys. Lett.
77
, 139
(2000
).13.
N.
Nakagiri
, T.
Yamamoto
, H.
Sugimura
, and Y.
Suzuki
, J. Vac. Sci. Technol. B
14
, 887
(1996
).14.
D. T.
Lee
, J. P.
Pelz
, and B.
Bhushan
, Nanotechnology
17
, 1484
(2006
).15.
Y.
Naitou
and N.
Ookubo
, Appl. Phys. Lett.
85
, 2131
(2004
).16.
Y.
Naitou
and N.
Ookubo
, Jpn. J. Appl. Phys., Part 1
43
, 1848
(2004
).17.
Y.
Naitou
, A.
Ando
, H.
Ogiso
, S.
Kamiyama
, Y.
Nara
, K.
Yasutake
, and H.
Watanabe
, J. Appl. Phys.
101
, 083704
(2007
).18.
Y.
Naitou
, H.
Arimura
, N.
Kitano
, S.
Horie
, T.
Minami
, M.
Kosuda
, H.
Ogiso
, T.
Hosoi
, T.
Shimura
, and H.
Watanabe
, Appl. Phys. Lett.
92
, 012112
(2008
).19.
J.
Freund
, J.
Halbritter
, and J. K. H.
Horber
, Microsc. Res. Tech.
44
, 327
(1999
).20.
B. L.
Weeks
, M. W.
Vaughn
, and J. J.
DeYoreo
, Langmuir
21
, 8096
(2005
).21.
K.
Ohara
and Y.
Cho
, J. Appl. Phys.
96
, 7460
(2004
).22.
Ansoft Corp.
, http://www.ansoft.com/products/hf/hfss/.23.
24.
Y.
Oyama
, Y.
Majima
, and M.
Iwamoto
, J. Appl. Phys.
86
, 7087
(1999
).25.
H.
Yokoyama
, T.
Inoue
, and J.
Itoh
, Appl. Phys. Lett.
65
, 3143
(1994
).© 2009 American Institute of Physics.
2009
American Institute of Physics
You do not currently have access to this content.